1. Photochemical wet etching of (0 0 1) plane ß-phase Ga2O3, and its anisotropic etching behavior.
- Author
-
Kim, Yukyung, Baek, Jueun, Baik, Kwang Hyeon, and Jang, Soohwan
- Subjects
- *
ETCHING , *CRYSTAL surfaces , *POTASSIUM hydroxide , *SURFACE energy , *SINGLE crystals - Abstract
[Display omitted] • Wet etching of (0 0 1) plane β -phase Ga 2 O 3 (β -Ga 2 O 3) under UV illumination was investigated. • The etching behavior of the (0 0 1) plane β -Ga 2 O 3 was compared with those of (2 ¯ 01) and (0 1 0) plane. • The oval line-shaped etch pit along [0 1 0] direction was observed on the etched (0 0 1) plane β -Ga 2 O 3. The photochemical (PC) wet etching behavior of (0 0 1) plane β -phase Ga 2 O 3 (β -Ga 2 O 3) single crystal was investigated using potassium hydroxide etchant solution under ultraviolet illumination in the temperature range of 80–95 °C. The etch rate was 1.65 nm/min at 80 °C, and increased up to 4.88 nm/min at 95 °C. The etch rate of the (0 0 1) plane β -Ga 2 O 3 shows strong temperature dependence with the activation energy of 0.798 eV. The PC wet etching characteristics of the (0 0 1) plane β -Ga 2 O 3 was compared with those of (2 ¯ 01) and (0 1 0) plane β -Ga 2 O 3. The etch rates increased in order of the (0 1 0), (2 ¯ 01) , and (0 0 1) plane, which is accordance with the increasing surface energy trend. The oval line-shaped grooves aligned along [0 1 0] direction were observed on the etched (0 0 1) plane β -Ga 2 O 3 crystal surface after 30 min. PC wet etching at 80 °C. [ABSTRACT FROM AUTHOR]
- Published
- 2024
- Full Text
- View/download PDF