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TiO 2 thin films are of paramount importance due to their pervasive applications. In contrast to previous published works where the substrate was heated at high temperatures to obtain TiO 2 crystalline phase, we show in this study that it is possible to deposit crystalline TiO 2 thin films on biased and unbiased substrate at room temperature using reactive rf magnetron sputtering. The bias voltage was varied from 0 V to −100 V. The deposited films were characterized using X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), UV–vis spectroscopy, Raman spectroscopy, X-ray Photoelectron Spectroscopy (XPS) and atomic force microscopy (AFM). The average crystallite size was estimated using x-ray diffraction. The results showed that the application of negative bias affects the surface roughness of the films and favors the formation of the rutile phase. The root mean square roughness (R rms ), the average grain size and the optical band gap of the films decreased as the substrate bias voltage was varied from 0 to −100 V. The UV–visible transmittance spectra showed that the films were transparent in the visible range and absorb strongly in the UV range. This study shows that biasing the substrate could be a promising and effective alternative to deposit TiO 2 crystallized thin films of engineered properties at room temperature. [ABSTRACT FROM AUTHOR]

The aim of this study is to investigate the influence of plasma deposition parameters (the pressure and the substrate bias voltage Vs) on structure, surface morphology, hardness and electrochemical behavior (studied by potentiodynamic polarization and optical microscope (OM) in aggressive environment NaCl 3.5 wt%) of TiAlN coatings. The coatings were deposited by reactive RF magnetron sputtering (13.56 MHz). They were carried out during 60 min and their thickness was approximately 1 μm. Structural analysis shown that TiAlN coating crystallized in cubic (fcc) and hexagonal (hcp) structure with orientations in (1 0 0), (1 1 1), (2 0 0), (1 1 0), (2 2 0) and (3 1 1) planes. The deposited coatings present maximum hardness ( H = 25.75 GPa) and Young's modulus ( E = 479.82 GPa) at low pressure (20 mTorr) and −60 V of negative substrate bias. Also, mechanical properties ( H & E ) were strongly influenced by coatings density and grain size. Electrochemical tests revealed that XC48 steel substrate covered with TiAlN coating exhibits excellent corrosion resistance. [ABSTRACT FROM AUTHOR]

In this study we present the effect of negative bias applied to substrate and the pressure on the properties of TiC films (i.e. structure, Raman spectroscopy, electrical resistivity and hardness). The elaboration of our films has been carried out by RF-Magnetron Sputtering, 13.56 MHz, using two targets: titanium carbide and pure titanium. The film depositions have been done on silicon, glass and steel substrates. The total pressure was 10-60 mTorr. The attention was given to study the influence of different parameters, pressure and substrate-bias, on the properties of TiC layers. In this paper, a comparison between the properties of TiC prepared using pure titanium target and titanium carbide target is made. The deposited layers were characterized by XRD analysis, nanoindentation, four probe technique and Raman spectroscopy. [ABSTRACT FROM AUTHOR]

• ZrO 2 films were deposited on stainless steel 316L by RF magnetron sputtering. • The ZrO 2 coated 316L are hydrophobic. • Bioactivity tests in vitro demonstrate the formation of a hydroxyapatite layer on the films surface. The zirconia (ZrO 2) films were deposited using radio-frequency magnetron sputtering (RFMS) from a pure zirconium target in Ar-O 2 gas mixture with different percentage of the oxygen. The effect of Oxygen percentage on the film's characteristics was investigated by Raman spectroscopy, X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and tribology test. Also, the contact angle of the films was measured in order to evaluate their hydrophobicity. Additionally, in vitro test in artificial blood plasma and further SEM observations were performed to study bioactivity of the films. The experimental results showed that the roughness, the porosity and the thickness of the films depend on the oxygen percentage. According to XRD and Raman spectroscopy results, the films present a polymorph phase of monoclinic and tetragonal. Zirconia films at low oxygen percentage showed better hydrophobic behavior with 114.5° at 15% of oxygen. These films also exhibit a lower friction coefficient and wear rate (0.22 and 6 × 10−07 mm3/m respectively). However the best bioactive behavior was exhibited by the films deposited at 25% of oxygen due to their higher roughness and porosity. In fact, it was found that the bioactivity of the films is highly dependent on the porosity and roughness of the films. [ABSTRACT FROM AUTHOR]