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The semiconductor etch cluster facility is the most used facility platform in the semiconductor manufacturing process. Optimizing cluster facilities can depend on production schedules and can have a direct impact on productivity. According to the diversity of semiconductor processes, the complexity of optimization is also increasing. Various optimization methods have been studied in many papers for optimizing such a complex cluster facility. However, there is a lack of discussion of how these methods can apply to practical semiconductor manufacturing fabs and the actual performance results. Even now, data analysis and optimal parameter derivation for maximizing the productivity of cluster manufacturing in semiconductor manufacturing fabs are continuing. In this study, we propose an automated method for data collection and analysis of the cluster, which used to be done manually. In addition, the derivation of optimization parameters and application to facilities are addressed. This automated method could improve the manual analysis methods, such as simulation through data analysis using machine learning algorithms. It could also solve the inefficiency caused by manual analysis performed within the network inside the semiconductor manufacturing fabs.