1. Structural evolution of ZnO/sapphire(001) heteroepitaxy studied by real time synchrotron x-ray scattering
- Author
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Jung Ho Je, Tae-Sik Cho, Seok Joo Doh, Sang Il Park, and Jong-Lam Lee
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,Scattering ,business.industry ,Substrate (electronics) ,Sputter deposition ,Epitaxy ,Synchrotron ,law.invention ,Full width at half maximum ,Optics ,law ,Sapphire ,Stress relaxation ,Optoelectronics ,business - Abstract
The structural evolution during heteroepitaxial growth of ZnO/sapphire(001) by radio-frequency magnetron sputtering has been studied using real-time synchrotron x-ray scattering. The two-dimensional (2D) ZnO(002) layers grown in the initial stage are highly strained and well aligned to the substrate having a mosaic distribution of 0.01° full width at half maximum (FWHM), in sharp contrast to the reported transition 2D layers grown by molecular-beam epitaxy. With increasing film thickness, the lattice strain is relieved and the poorly aligned (1.25° FWHM) three-dimensional (3D) islands are nucleated on the 2D layers. We attribute the 2D–3D transition to the release of the strain energy stored in the film due to the film/substrate lattice mismatch.
- Published
- 2000