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Defect formation in dehydrated silica glasses was investigated using various excimer lasers with different energies. The ArF laser (6.4 eV) generates the E’ center more effectively than the KrF laser (5.0 eV), while the XeCl laser (4.0 eV) generated no centers. Defect generation was found to be proportional to the square of the laser photon density, indicating that it occurs dominantly due to a two-photon process which makes band-to-band excitation possible. The E’ center probably originated from oxygen-deficient centers. Contributions to the E’ center formation from a process involving direct absorption at the sites of intrinsic defects in SiO2 glass were discussed on the basis of the excitation energy dependence and a comparison with the effect of a low-pressure mercury lamp. [ABSTRACT FROM AUTHOR]

A new structure semi-insulator-embedded flat-surface buried heterostructure 1.3 μm InGaAsP/InP laser has been developed using chloride vapor phase epitaxy. cw threshold currents as low as 18 mA and high-temperature cw operation up to 100 °C have been obtained. Small-signal response above 4 GHz has been achieved and no remarkable roll-off has been observed, which is due to small parasitic capacitance. [ABSTRACT FROM AUTHOR]