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We present room-temperature pseudodielectric function spectra 〈e〉 of InxGa1−xAs films grown on (100) InP by solid-source molecular-beam epitaxy. A wet-chemical etching procedure is used to remove overlayers and obtain the best approximation to the bulk dielectric responses e of the films. By line shape fitting, we determined the x dependences of the E1 and E1+Δ1 critical-point energies and that of the Δ1 bowing parameter. The results are in good agreement with the predictions of a universal tight-binding model.

We present the results of the formation of the InAs quantum dots (QDs) on the (100) In1−xAlxAs(InAlAs)/InP substrate by using relaxed InAlAs buffer layers with different compositions. Variations of surface morphology of InAs QDs as a function of InAs–InAlAs lattice mismatch have been evaluated by atomic force microscopy. When the lattice mismatch increases from 2.4% to 4.2%, the size of QDs decreases, and the density of QDs increases. Each of these dependences can be fitted to a power function of the misfit unless the Al diffusion, roughness of the buffer layer, and/or the ripening of small dots modify the size and density.

N-type ZnTe layers with high electron concentration are grown by molecular-beam epitaxy using aluminum as the donor species. The ZnTe:Al layers show a high structural quality with a narrow x-ray diffraction linewidth (24 arcsec) and a high carrier concentration up to n=4×1018 cm−3 with low resistivity (ρ=0.017 Ω cm). The dependence of the electron mobility on the carrier concentration suggests that the dominant scattering mechanisms in the ZnTe:Al layers are ionized impurity scattering and polar optical phonon scattering. The photoluminescence spectrum of moderately doped ZnTe layers shows strong Al–donor-related bound exciton lines: I2 (2.378 eV) and donor–acceptor pair emission (zero phonon energy=2.324 eV) with a weak deep-level emission (2.19 eV). Highly Al-doped layers show an increase in the deep-level emission intensity and a decrease in carrier mobility, which are interpreted in terms of the increase in the carrier compensation.