1. Enhancement-mode Al0.85Ga0.15N/Al0.7Ga0.3N high electron mobility transistor with fluorine treatment.
- Author
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Klein, Brianna A., Douglas, Erica A., Armstrong, Andrew M., Allerman, Andrew A., Abate, Vincent M., Fortune, Torben R., and Baca, Albert G.
- Subjects
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ALUMINUM compounds , *MODULATION-doped field-effect transistors , *FLUORINE , *THRESHOLD voltage , *CURRENT density (Electromagnetism) - Abstract
Enhancement-mode Al0.7Ga0.3N-channel high electron mobility transistors (HEMTs) were achieved through a combination of recessed etching and fluorine ion deposition to shift the threshold voltage (VTH) relative to depletion-mode devices by +5.6 V to VTH = +0.5 V. Accounting for the threshold voltage shift (ΔVTH), current densities of approximately 30 to 35 mA/mm and transconductance values of 13 mS/mm were achieved for both the control and enhancement mode devices at gate biases of 1 V and 6.6 V, respectively. Little hysteresis was observed for all devices, with voltage offsets of 20 mV at drain currents of 1.0 × 10−3 mA/mm. Enhancement-mode devices exhibited slightly higher turn-on voltages (+0.38 V) for forward bias gate currents. Piecewise evaluation of a threshold voltage model indicated a ΔVTH of +3.3 V due to a gate recess etching of 12 nm and an additional +2.3 V shift due to fluorine ions near the AlGaN surface. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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