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Irradiation with intense ultraviolet laser pulses induced a large refractive-index change in 30GeO2-70SiO2 waveguide-grade thin films prepared by the plasma-enhanced chemical vapor deposition method, which contained a large amount of photoactive Ge2+ defects. The maximum index change in the as-deposited films by KrF and XeF excimer laser irradiation was estimated to be 1.2 x 10(-3) and 0.28 x 10(-3), respectively. These results clearly indicate that the photorefractivity of GeO2-SiO2 glasses is due to a Ge2+ defect in origin. The channel waveguide and the planar Bragg gratings were directly written in the photoactive Ge(2+)-enriched GeOs-SiO2 thin films by pulsed ultraviolet laser irradiation with a Cr-metal-loaded-type waveguide structure.

We designed and fabricated an achromatic infrared wave plate. To examine its phase retardation characteristics, the birefringence was calculated using the effective medium theory. A wave plate with a subwavelength grating was fabricated by direct imprint lithography on a low toxic chalcogenide glass (Sb–Ge–Sn–S system) based on calculated results. As a result of imprinting onto chalcogenide glass by a glassy carbon mold, a grating with 1.63 μm depth, a fill factor of 0.7, and a 3 μm period was obtained. The phase retardation of the elements reached around 30° in the 8.5–10.5 μm wavelength range. The fabrication of the infrared wave plate is less costly compared with conventional crystalline wave plates.

GeAsSeTe, GeSeTeTl, and GeSeTe glass fibers with a core-cladding structure were prepared by one of two methods: crucible drawing or preform drawing. The diameter of the core was 340 microm and that of the cladding was 440 microm. The transmission loss spectra of the fibers were measured by the cut-back method. The crucible drawing method was preferable to reduce the loss due to structural imperfections at the interface of the core and cladding. The lowest loss of 1.7 dB/m was achieved at 10.6 microm (the wavelength of the CO(2) laser) in the fibers with a GeSeTe core and a GeAsSeTe cladding. Transmission of CO(2) laser power was examined using a 1.5-m long fiber and an output power of 2 W (2.2 kW/cm(2) in power density) was obtained.

We examined the effect of an antireflection (AR) coating to enhance the TM transmittance of the wire-grid polarizer. The polarization transmission spectra were calculated using the rigorous coupled-wave analysis. As a result, we verified that an AR film should be inserted between a wire-grid and a Si substrate as regards the TM transmittance and the polarization function. Based on the simulation results, we fabricated a tungsten silicide (WSi) wire-grid polarizer with SiO films on both sides of the Si substrate. The transmittance exceeded 80% at a 4-5 microm wavelength range, although the theoretical transmittance of Si substrate is 54% and the ratio of the TM and TE transmittances reached 24 dB at a 3 microm wavelength when the WSi grating has a 300 nm thickness, a 400 nm period, and a fill factor of 0.6. Wire-grid polarizers with higher transmittance and larger extinction ratio can be obtained by adjusting the AR film thickness, the fill factor, and the thickness of the WSi grating.

We designed and fabricated a tungsten silicide wire-grid polarizer. To examine its polarization characteristics, the transmission spectra of the polarizer were simulated using the effective medium theory. The polarizer was fabricated based on the simulation results. The transverse magnetic (TM) polarization transmittance of the fabricated polarizer was greater than 50% over the 5 mum wavelength, and the ratio of TM and transverse electric transmittance was greater than 100 (20 dB) in the infrared range. This fabricated polarizer has higher durability and better compatibility with microfabrication processes than conventional infrared polarizers.

Photon-induced property changes of sputter-deposited GeO(2)-SiO(2) thin glass films were investigated. Irradiation with ArF laser pulses induced the changes in refractive index of -10% and volume of +30% in the film without ablation. A Bragg grating with a positive sinusoid wave pattern was printed upon the film by irradiation with ArF excimer laser pulses through a phase mask. The irradiated area could be quickly etched by a HF solution. The ratio of etching rate of irradiated area to unirradiated area was higher than 30. A Bragg grating with a surface relief pattern was successfully formed on the film by irradiation with excimer laser pulses followed by chemical etching. Diffraction efficiency of the gratings increased by 25 times with the etching.

Binary gratings were fabricated with high first-order diffraction efficiency by conventional electron-beam drawing and subsequent inductive coupled-plasma dry etching upon the surfaces of SiO2 glass plates. The gratings were covered with a thin SiO2 film by plasma-enhanced chemical-vapor deposition without the grooves' being filled in. The buried gratings exhibited first-order diffraction efficiencies of 84% for transverse-electric and 87% for transverse-magnetic polarized light at a wavelength of 1.55 microm when the period and the depth were 1.5 and 2.8 microm, respectively.

Photosensitive ZrO(2) gel films were patterned with a two-beam interference method by use of a 325-nm-wavelength He-Cd laser for the first time to our knowledge. The ZrO(2) gel films were prepared from Zr(O-n-C(4)H(9))(4) chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-microm period on Si or SiO(2) substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He-Ne laser. Blazed gratings could also be fabricated.

The spectral spacing of the interference fringes formed by a pair of long-period fiber gratings was investigated. The variation of the fringe spacing was measured while the separation between the gratings was changed from 22 to 500 mm. When the grating separation was much longer than the length of the individual grating, the inverse of the fringe spacing became linearly proportional to the grating separation and to the differential effective group index of the fiber. In the third stop band of the grating pair, made along a dispersion-shifted fiber centered at 1.55 microm, the differential effective group index was calculated to be approximately 6.4 x 10(-3), which is approximately twice the differential effective index of the fiber. The discrepancy between the two indices was observed to decrease with the band order, a phenomenon that is explained by the first-order dispersion of the fiber. The measured interference fringes were not regularly spaced in the frequency domain, but regular spacing is required in wavelength-division multiplexing communication systems. Analysis of the second-order dispersion of the fiber and the grating-induced nonlinear phase shift within grating regions as the factors that induce chirping on the fringe spacing is presented.