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Conducting oxide interfaces have attracted considerable attention, motivated by both fundamental science and potential for oxide electronic devices. An important gap for maturing such device technology is scalability and routes to control the electronic properties, which can narrow the device engineering space. Here, we demonstrate and explain the mechanisms of highly tunable conductive oxide interfaces. We synthesized amorphous--crystalline Al2O3/SrTiO3 interfaces using the scalable and industry-compatible atomic layer deposition (ALD) technique. An NH3 plasma pretreatment is employed in the ALD chamber, and its duration is used as a tuning parameter for the electrical properties, where a span of three orders of magnitude in the sheet resistance is observed at room temperature. For the most conductive sample, our results are comparable to the highest carrier density values reported for all-crystalline oxide interfaces prepared with state-of-the-art epitaxial growth techniques, such as pulsed laser deposition. We pinpoint the origin of conductivity to oxygen vacancies caused by the SrTiO3 reduction by the NH3 plasma pretreatment. These results present a simple, scalable, and industry-compatible route for realizing conductive oxide interfaces, with a broad parameter space, offering a versatile and flexible toolkit for oxide device engineering. [ABSTRACT FROM AUTHOR]

Heusler compounds, in both cubic and hexagonal polymorphs, exhibit a remarkable range of electronic, magnetic, elastic, and topological properties, rivaling that of the transition metal oxides. To date, research on these quantum materials has focused primarily on bulk magnetic and thermoelectric properties or on applications in spintronics. More broadly, however, Heuslers provide a platform for discovery and manipulation of emergent properties at well-defined crystalline interfaces. Here, motivated by advances in the epitaxial growth of layered Heusler heterostructures, I present a vision for Heusler interfaces, focusing on the frontiers and challenges that lie beyond spintronics. The ability to grow these materials epitaxially on technologically important semiconductor substrates, such as GaAs, Ge, and Si, provides a direct path for their integration with modern electronics. Further advances will require new methods to control the stoichiometry and defects to "electronic grade" quality and to control the interface abruptness and ordering at the atomic scale. [ABSTRACT FROM AUTHOR]