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Efficient generation of 13.5 nm light with increased conversion efficiency and output power is important for Extreme Ultraviolet (EUV) lithography applications. In this study, we present a computational investigation of plasma dynamics and EUV generation from laser-driven plasma, with specific focus on the influence of magnetic fields, ranging up to 50 T. Simulations show that the plasma expansion is restricted based on the direction and strength of the magnetic field, resulting in an anisotropic plasma confinement, which in turn allows for radiation escape with a reduced loss. Moreover, angle-dependent measurements show an increase in in-band EUV (2% bandwidth around 13.5 nm) yield, reaching a peak enhancement of up to 40% when a magnetic field is applied, particularly when it is oriented perpendicular to the laser axis. The ability to control plasma dynamics by magnetic field offers exciting prospects for optimizing EUV radiation sources. [ABSTRACT FROM AUTHOR]

We present experimental results of two head-on colliding plasma sheaths accelerated by pulsed-power-driven coaxial plasma accelerators. The measurements have been performed in a small vacuum chamber with a neutral-gas prefill of ArH2 at gas pressures between 17 Pa and 400 Pa and load voltages between 4 kV and 9 kV. As the plasma sheaths collide, the electron density is significantly increased. The electron density reaches maximum values of ≈8.1015 cm-3 for a single accelerated plasma and a maximum value of ≈2.6 . 1016 cm-3 for the plasma collision. Overall a raise of the plasma density by a factor of 1.3 to 3.8 has been achieved. A scaling behavior has been derived from the values of the electron density which shows a disproportionately high increase of the electron density of the collisional case for higher applied voltages in comparison to a single accelerated plasma. Sequences of the plasma collision have been taken, using a fast framing camera to study the plasma dynamics. These sequences indicate a maximum collision velocity of 34 km/s. [ABSTRACT FROM AUTHOR]