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Start Over Author "Linus A. Fetter" Journal advances in resist technology and processing xi
1 results on '"Linus A. Fetter"'

1. Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

Author

Linus A. Fetter, Anthony E. Novembre, Omkaram Nalamasu, W. W. Tai, Regine G. Tarascon-Auriol, and Janet M. Kometani

Subjects
Materials science, Resist, Cathode ray, Analytical chemistry, Infrared spectroscopy, Lithography, Beam (structure)
Abstract

The electron-beam lithographic response of CAMP6 is evaluated and compared to the characteristics of the chemically amplified resist under deep UV exposure. The optimization of the electron- beam lithographic properties of the positive deep UV resist CAMP6 has been performed by evaluating the effects of prebake temperature (ranging from 115 to 140 degree(s)C) and post-exposure bake temperature (ranging from 115 to 150 degree(s)C) on the observed resist thickness loss and percent of t-BOC group deprotection as measured by IR spectroscopy.

Published
1994

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