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SiOxCuOy thin films were prepared by the deposition on to the Si/SiO2 substrates from the alcoholic solutions employing the sol-gel technique. The various analytic techniques were applied to characterize structure and properties of the films under study . The both X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) studies showed the presence CuO as well as CuO2 phases and formation of a dual-oxide CuSiO3 with the average crystallites sizes of 35-50 nm. The conductance of the films was rather sensitive to the presence of 1-20 ppm NO2 concentration at the operating temperatures in the range of 20–200 ◦C.