1. Research Progress in Gasochromics Mechanism of Tungsten Oxide Thin Films
- Author
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Zhao Xia Hou, Hao Lei, Yutaka Sawada, Yoichi Hoshi, Jia Xing Wen, Mei Han Wang, and Takayuki Uchida
- Subjects
Materials science ,Semiconductor ,business.industry ,Atom ,General Engineering ,Molecule ,Gas detector ,Nanotechnology ,Thin film ,business ,Single crystal ,Mechanism (sociology) ,Catalysis - Abstract
The gasochromic effect and its potential applications of tungsten oxide (WO3) thin films are introduced. The research progress in gasochromics mechanism of WO3films is reviewed and various mechanism models are summarized and discussed. The double injection model, oxygen vacancy diffusion model and localized water molecules model are extensively used to explain the gasochromic coloration of WO3films. A perspective on the gasochromics mechanism development of WO3films is tended to fabricate WO3film with single crystal and regular structure, which may simply the quantitative characterizations induced by the complicated structure. Elucidating gasochromics mechanism of WO3films not only helps to understand gasochromic coloration phenomenon well but also improves the performance of gasochromic coloration devices. It also accelerates the development of the relative science, such as gas detector, atom/ion transport material, surface catalysis of semiconductor, and so on.
- Published
- 2014