1. Gate-Coupling-Enabled Robust Hysteresis for Nonvolatile Memory and Programmable Rectifier in Van der Waals Ferroelectric Heterojunctions
- Author
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Jun He, Yuyu Yao, Lei Yin, Marshet Getaye Sendeku, Ruiqing Cheng, Feng Wang, Wenhao Huang, Zhenxing Wang, Junjun Wang, and Ningning Li
- Subjects
Materials science ,business.industry ,Mechanical Engineering ,Transistor ,Heterojunction ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Ferroelectricity ,0104 chemical sciences ,law.invention ,Non-volatile memory ,symbols.namesake ,Hysteresis ,Rectifier ,Rectification ,Mechanics of Materials ,law ,symbols ,Optoelectronics ,General Materials Science ,van der Waals force ,0210 nano-technology ,business - Abstract
Ferroelectric field-effect transistors (FeFETs) are one of the most interesting ferroelectric devices; however, they, usually suffer from low interface quality. The recently discovered 2D layered ferroelectric materials, combining with the advantages of van der Waals heterostructures (vdWHs), may be promising to fabricate high-quality FeFETs with atomically thin thickness. Here, dual-gated 2D ferroelectric vdWHs are constructed using MoS2 , hexagonal boron nitride (h-BN), and CuInP2 S6 (CIPS), which act as a high-performance nonvolatile memory and programmable rectifier. It is first noted that the insertion of h-BN and dual-gated coupling device configuration can significantly stabilize and effectively polarize ferroelectric CIPS. Through this design, the device shows a record-high performance with a large memory window, large on/off ratio (107 ), ultralow programming state current (10-13 A), and long-time endurance (104 s) as nonvolatile memory. As for programmable rectifier, a wide range of gate-tunable rectification behavior is observed. Moreover, the device exhibits a large rectification ratio (3 × 105 ) with stable retention under the programming state. This demonstrates the promising potential of ferroelectric vdWHs for new multifunctional ferroelectric devices.
- Published
- 2019