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For practical device applications, monolayer transition metal dichalcogenide (TMD) films must meet key industry needs for batch processing, including the high-throughput, large-scale production of high-quality, spatially uniform materials, and reliable integration into devices. Here, high-throughput growth, completed in 12 min, of 6-inch wafer-scale monolayer MoS2 and WS2 is reported, which is directly compatible with scalable batch processing and device integration. Specifically, a pulsed metal-organic chemical vapor deposition process is developed, where periodic interruption of the precursor supply drives vertical Ostwald ripening, which prevents secondary nucleation despite high precursor concentrations. The as-grown TMD films show excellent spatial homogeneity and well-stitched grain boundaries, enabling facile transfer to various target substrates without degradation. Using these films, batch fabrication of high-performance field-effect transistor (FET) arrays in wafer-scale is demonstrated, and the FETs show remarkable uniformity. The high-throughput production and wafer-scale automatable transfer will facilitate the integration of TMDs into Si-complementary metal-oxide-semiconductor platforms.

PURPOSE: A graphene sheet using inkjet printing and a wideband dipole antenna application are provided to minimize the loss of raw material and time. CONSTITUTION: Waterborne graphene oxide nano particle solution is manufactured and is used for conductive ink of inkjet printing. The chemical characteristic of the waterborne graphene oxide nano particle solution is changed in order to form a detailed pattern on a supporting material. The waterborne graphene oxide nano particle solution is injected to a printer head, and an oxide graphene thin film is formed. The supporting material including the oxide graphene thin film is located in a vapor deposition reactor, and an oxidation-reduction reaction is executed. A graphene sheet based broadband dipole antenna electrode is connected to an antenna analysis device, and the performance of the antenna is measured.