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Start Over Author "Xu, Y.Q." Journal 2006 international workshop on junction technology
2 results on '"Xu, Y.Q."'

1. Nickel SALICIDE Process Technology for CMOS Devices of 90nm Node and Beyond

Author

Lu, J.P., primary, Miles, D.S., additional, DeLoach, J., additional, Yue, D.F., additional, Chen, P.J., additional, Bonifield, T., additional, Crank, S., additional, Yu, S.F., additional, Mehrad, F., additional, Obeng, Y., additional, Ramappa, D.A., additional, Corum, D., additional, Guldi, R.L., additional, Robertson, L.S., additional, Liu, X., additional, Hall, L.H., additional, Xu, Y.Q., additional, Lin, B.Y., additional, Griffin, A.J., additional, Johnson, F.S., additional, Grider, T., additional, Mercer, D., additional, and Montgomery, C., additional

Published
2006
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2. Nickel SALICIDE Process Technology for CMOS Devices of 90nm Node and Beyond

Author

Lu, J.P., primary, Miles, D.S., additional, DeLoach, J., additional, Yue, D.F., additional, Chen, P.J., additional, Bonifield, T., additional, Crank, S., additional, Yu, S.F., additional, Mehrad, F., additional, Obeng, Y., additional, Ramappa, D.A., additional, Corum, D., additional, Guldi, R.L., additional, Robertson, L.S., additional, Liu, X., additional, Hall, L.H., additional, Xu, Y.Q., additional, Lin, B.Y., additional, Griffin, A.J., additional, Johnson, F.S., additional, Grider, T., additional, Mercer, D., additional, and Montgomery, C., additional

Full Text
View/download PDF

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