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1. Erratum: “Comparative analysis of void-containing and all-semiconductor 1.5 µm InP-based photonic crystal surface-emitting laser diodes” [AIP Adv. 11, 065315 (2021)]

2. Comparative analysis of void-containing and all-semiconductor 1.5 µm InP-based photonic crystal surface-emitting laser diodes

4. Void engineering in epitaxially regrown GaAs-based photonic crystal surface emitting lasers by grating profile design

7. List of Contributors

8. Raman Scattering and Photoluminescence of GaAs-Based Nanostructures

9. Conduction in n+-GaAs Wires

11. InAs FinFETs With Hfinnm Fabricated Using a Top–Down Etch Process

18. G.P.285

19. Coherently Coupled Photonic Crystal Surface Emitting Lasers

22. Terahertz oscillations in an In0.53Ga0.47As submicron planar Gunn diode

23. InAs N-MOSFETs with record performance of Ion = 600 μA/μm at Ioff = 100 nA/μm (Vd = 0.5 V)

33. Nanoimprint induced electrical type conversion in HgCdTe

40. Deep sub-micron and self-aligned flatband III–V MOSFETs

44. III-V MOSFETs for Digital Applications with Silicon Co-Integration

47. GaAs MOSFETs - a viable single supply III-V RF technology solution?

48. 1 [micro sign]m gate length, In0.75Ga0.25As channel, thin body n-MOSFET on InP substrate with transconductance of 737 [micro sign]S/μm

50. Erratum for ‘1 [micro sign]m gate length, In0.75Ga0.25As channel, thin body n-MOSFET on InP substrate with transconductance of 737 [micro sign]S/μm’

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