21 results on '"Tanjyo, M."'
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2. Comparison of Charge-up Phenomena between Negative- and Positive-Ion Implantations
3. Comparison of BF2, In, Ga, C+Ga & In+BF2 Dopant for 22nm node bulk & PD-SOI HALO implantation or ground plane back-gate doping for FD-SOI CMOS technologies
4. CLARIS G2: Development of Carbon Cluster Implantation
5. Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-
6. Scatter Defects and Hall Scattering Factor For The Mobility of Boron In Silicon
7. Cluster Carbon ion implantation for NMOS device fabrication improvements
8. Optimization of implant and anneal processes
9. Carrier activation in cluster boron implanted Si
10. Nissin’s New Cluster Implanter: CLARIS
11. Advantageous Decaborane Ion Implantation for Ultra-shallow Junction of PMOSFETs Compared with Boron Monomer Implantation into Germanium Preamorphized Layer
12. High quality ion implanter; EXCEED3000AH-Nx for 45nm beyond I/I process<Beam Size and Angle>
13. Versatile medium ion implanter EXCEED2300V
14. Performance of RF plasma flood gun for medium current implanter
15. Quadrupole Stabilization of then=2Rotational Instability of a Field-Reversed Theta-Pinch Plasma
16. A low energy plasma flood gun using RF plasma formation
17. Low energy implantation technology with molecular ion beam
18. Performance of a plasma flood gun in the medium current ion implanter Exceed200OA
19. Advantageous Decaborane Ion Implantation for Ultra-shallow Junction of PMOSFETs Compared with Boron Monomer Implantation into Germanium Preamorphized Layer
20. High quality ion implanter; EXCEED3000AH-Nx for 45nm beyond I/I process
21. Hydrogen free diborane ion source using 500 MHz RF discharge
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