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4. Forming-Free HfO2-Based Resistive Random Access Memory by X-Ray Irradiation

10. Use of a supercritical fluid treatment to improve switching region in resistive random access memory

14. Effects of X-ray accelerating voltage on electrical properties and reliability for ferroelectric random-access memory (FeRAM)

16. Performance Improvement by Modifying Deposition Temperature in HfZrO x Ferroelectric Memory

17. Abnormal hump in low temperature in SiGe devices with silicon capping insertion layer

21. Obtaining impact ionization-induced hole current by electrical measurements in gallium nitride metal–insulator–semiconductor high electron mobility transistors

22. Realizing forming-free characteristic by doping Ag into HfO2-based RRAM

23. Improving Performance by Inserting an Indium Oxide Layer as an Oxygen Ion Storage Layer in HfO₂-Based Resistive Random Access Memory

24. A high-speed MIM resistive memory cell with an inherent vanadium selector

25. Analyzing the interface trap density in SiGe capacitors using an abnormal flat band voltage shift at low temperature

26. Investigation on the current conduction mechanism of HfZrOx ferroelectric memory

27. Impact of electrode thermal conductivity on high resistance state level in HfO2-based RRAM

29. Utilizing compliance current level for controllability of resistive switching in nickel oxide thin films for resistive random-access memory

30. Incorporation of Resistive Random Access Memory into Low‐Temperature Polysilicon Transistor with Fin‐Like Structure as 1T1R Device

31. Improvement of Resistive Switching Characteristics in Zinc Oxide-Based Resistive Random Access Memory by Ammoniation Annealing

32. A characteristic improved technique and analysis with plasma treatment to the electrode on oxide-based resistive random access memory

33. Abnormal High Resistive State Current Mechanism Transformation in Ti/HfO2/TiN Resistive Random Access Memory

34. Stabilizing resistive random access memory by constructing an oxygen reservoir with analyzed state distribution

35. Reducing Interface Traps with High Density Hydrogen Treatment to Increase Passivated Emitter Rear Contact Cell Efficiency

37. Investigation of the forming process under UV illumination in HfO2-based resistance random access memory with a transparent electrode

38. The influence of temperature on set voltage for different high resistance state in 1T1R devices

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