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6. Abnormal Threshold Voltage Shift and Sub-channel Generation in Top-Gate InGaZnO TFTs under Backlight Negative Bias Illumination Stress

8. Abnormal On Current Tendency in Saturation Region between High and Light Carbon Doped buffer layer in p-GaN HEMT

10. Forming-Free HfO2-Based Resistive Random Access Memory by X-Ray Irradiation

14. Use of a supercritical fluid treatment to improve switching region in resistive random access memory

24. Retraction notice to “Improvement Mechanism of resistance random access memory with supercritical CO2 fluid treatment” [J. Supercrit. Fluids, Volume 85, January 2014, Pages 183–189]

27. Clarifying the switching layer transformation through analysis of an abnormal I–V curves with increasing set compliance current in oxide-based resistive random access memory

32. Investigation of Degradation Behavior During Illuminated Negative Bias Temperature Stress in P-Channel Low-Temperature Polycrystalline Silicon Thin-Film Transistors

33. MOSFETs

35. Realizing forming-free characteristic by doping Ag into HfO2-based RRAM

36. Analysis of Edge Effect Occurring in Non-Volatile Ferroelectric Transistors

37. Improving Performance by Inserting an Indium Oxide Layer as an Oxygen Ion Storage Layer in HfO₂-Based Resistive Random Access Memory

38. Improvement of Hafnium Oxide Resistive Memory Performance Through Low-Temperature Supercritical Oxidation Treatments

39. Suppression of Edge Effect Induced by Positive Gate Bias Stress in Low-Temperature Polycrystalline Silicon TFTs With Channel Width Extension Over Source/Drain Regions

40. A high-speed MIM resistive memory cell with an inherent vanadium selector

45. Adaptive Synaptic Memory via Lithium Ion Modulation in RRAM Devices

46. Impact of electrode thermal conductivity on high resistance state level in HfO2-based RRAM

49. A Novel Structure to Reduce Degradation Under Mechanical Bending in Foldable Low Temperature Polysilicon TFTs Fabricated on Polyimide

50. Incorporation of Resistive Random Access Memory into Low‐Temperature Polysilicon Transistor with Fin‐Like Structure as 1T1R Device

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