128 results on '"Ribes, G"'
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2. Enzymatic hydrolysis of pea protein: Interactions and protein fractions involved in fermentation induced gels and their influence on rheological properties
3. Steroid Saponins from Fenugreek and some of their Biological Properties
4. Departmental Programme for the Early Prevention of Tobacco Addiction Among School Children
5. SiGe HBT / CMOS process thermal budget co-optimization in a 55-nm CMOS node
6. Nanoscale SiGe BiCMOS technologies: From 55 nm reality to 14 nm opportunities and challenges
7. Plasma induced damage investigation in the fully depleted SOI technology
8. New insight in plasma charging impact on gate oxide breakdown in FDSOI technology
9. A 55 nm triple gate oxide 9 metal layers SiGe BiCMOS technology featuring 320 GHz fT / 370 GHz fMAX HBT and high-Q millimeter-wave passives
10. Les enjeux de la résilience chez les personnes âgées
11. Plasma process inducing gate oxide breakdown in the FDSOI technology
12. Study of the effects of sodium dichloroacetate on several carbohydrate and lipid metabolites in normal and diabetic dogs
13. Aluminum charge/dipole passivation induced by hydrogen diffusion in high-k metal gate
14. New circuit model for investigating plasma damage in FDSOI devices
15. La sexualité du couple âgé : état des lieux, prise en charge
16. New insight on high-k/metal gate reliability modeling for providing guidelines for process development
17. Competitive and cost effective copper/low-k interconnect (BEOL) for 28nm CMOS technologies
18. Unified soft breakdown MOSFETs compact model: From experiments to circuit simulation
19. La sexualité de la personne obèse
20. Comprehensive investigations of CoWP metal-cap impacts on low-k TDDB for 32nm technology application
21. High-K gate stack breakdown statistics modeled by correlated interfacial layer and high-k breakdown path
22. Oxide Soft Breakdown : From device modeling to small circuit simulation
23. Oxide Soft BreakDown : From device modeling to small circuit simulation
24. Impact of progressive oxide soft breakdown on metal oxide semiconductor parameters: Experiment and modeling
25. Si O 2 interfacial layer as the origin of the breakdown of high-k dielectrics stacks
26. Understanding the Effect of Laser Anneal on LSTP 45nm Node MOS Transistor Electrical Parameters
27. La sexologie gérontologique
28. Sexual gerontology
29. Thérapie conjugale, thérapie sexuelle des couples âgés
30. Reliability issues for nano-scale CMOS dielectrics: - From transistors to product reliability - - From SiON to high-k dielectrics -
31. Contributions and limits of charge pumping measurement for addressing trap generation in high-k/SiO2 dielectric stacks
32. Post breakdown oxide lifetime based on digital circuit failure
33. New insight into the relation between Hot Carrier degradation and oxide breakdown through MVHR
34. Impact of TiN Metal gate on NBTI assessed by interface states and fast transient effect characterization
35. High-Activation Laser Anneal Process for the 45nm CMOS Technology Platform
36. Reliability issues for nano-scale CMOS dielectrics
37. New Insights on Percolation Theory and the Origin of Oxide Breakdown Thickness and Process Deposition Dependence
38. New Understanding on the Breakdown of High-K Dielectric Stacks using Multi-Vibrational Hydrogen Release Model
39. Unified Perspective of NBTI and Hot-Carrier Degradation in CMOS using on-the-Fly Bias Patterns
40. Highly Manufacturable and Cost-effective Single TaxC / HfxZr(1-x)O2 Gate CMOS Bulk Platform for LP Applications at the 45nm Node and Beyond
41. CMP-less Co-Integration of Tunable Ni-TOSI CMOS for Low Power Digital and Analog Applications
42. A Cost-Effective Low Power Platform for the 45-nm Technology Node
43. New Insight on the Origin of Stress Induced Leakage Current for SIO2/HFO2 Dielectric Stacks
44. Designing in reliability in advanced CMOS technologies
45. Origin of Vt Instabilities in High-$k$Dielectrics Jahn–Teller Effect or Oxygen Vacancies
46. New Insights into Recovery Characteristics Post NBTI Stress
47. Totally Silicided (TOSI) Gates as an evolutionary metal gate solution for advanced CMOS technologies
48. Paradigm Shift for NBTI Characterization in Ultra-Scaled CMOS Technologies
49. Reliability of Ultra Thin Gate Oxide CMOS Devices: Design Perspective
50. New Extensive MVHR Breakdown Models
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