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2. Anderson transition in compositionally graded p-AlGaN

3. High p-conductivity in AlGaN enabled by polarization field engineering

4. High conductivity in Ge-doped AlN achieved by a non-equilibrium process

7. Schottky contacts on ultra-high-pressure-annealed GaN with high rectification ratio and near-unity ideality factor

8. High conductivity and low activation energy in p-type AlGaN

9. Analysis of Vertical GaN JBS and p-n Diodes by Mg Ion Implantation and Ultrahigh-Pressure Annealing

12. Vertical GaN junction barrier Schottky diodes with near-ideal performance using Mg implantation activated by ultra-high-pressure annealing

13. On the conduction mechanism in compositionally graded AlGaN

14. Low resistivity, p-type, N-Polar GaN achieved by chemical potential control

16. UVC optoelectronics based on AlGaN on AlN single crystal substrates

18. Record >10 MV/cm mesa breakdown fields in Al0.85Ga0.15N/Al0.6Ga0.4N high electron mobility transistors on native AlN substrates

20. Large‐Area, Solar‐Blind, Sub‐250 nm Detection AlGaN Avalanche Photodiodes Grown on AlN Substrates

22. Doping and compensation in heavily Mg doped Al-rich AlGaN films

25. A pathway to highly conducting Ge-doped AlGaN

27. Study on avalanche breakdown and Poole–Frenkel emission in Al-rich AlGaN grown on single crystal AlN

29. On the Ge shallow-to-deep level transition in Al-rich AlGaN

34. Self-compensation in heavily Ge doped AlGaN: A comparison to Si doping

38. The nature of the DX state in Ge-doped AlGaN

39. Shallow Si donor in ion-implanted homoepitaxial AlN

41. The role of chemical potential in compensation control in Si:AlGaN

42. High gain, large area, and solar blind avalanche photodiodes based on Al-rich AlGaN grown on AlN substrates

45. (Invited) Advances in Ion Implantation of GaN and AlN

47. Development of Near UV Laser Diodes

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