76 results on '"Gujrathi S"'
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2. The Characterization of Depth Profiles of Thin Films and Interfaces by Nuclear Scattering Techniques
3. Nuclear Scattering Profiles of Polyimide-Metal Interfaces
4. P356 Safety and PK results of a thorough QT/QTc (TQT) study of orally administered RPC1063, a novel, selective S1P1 receptor agonist
5. Oxygen incorporation and charge donor activation via subplantation during growth of indium tin oxide films
6. Electrical characterization of amorphous silicon carbide thin films deposited via polymeric source chemical vapor deposition
7. Lifetimes of states inNe19above theO15+αbreakup threshold
8. Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
9. Lifetime of19Ne*(4.03 MeV)
10. The Impact of the Rare-earth Precursor on the Composition, Structure and Luminescence of Er-doped Silicon-rich Silicon Oxide Films
11. Chemical and Structural Characterization of SiONC Dielectric Thin Film Deposited by PSCVD
12. Bright Green Visible Electroluminescence from Rare Earth Doped Silicon Rich SiOx
13. Allegria: a new interface to the ERD program
14. ERD, 15N external beam for NRRA in air, HIRBS: ion beam analysis developments on the HVEC EN-1 Tandem
15. Epitaxial metastable Ge1−yCy (y⩽0.02) alloys grown on Ge(001) from hyperthermal beams: C incorporation and lattice sites
16. Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering
17. Effect of in situ plasma oxidation of TiN diffusion barrier for AlSiCu/TiN/Ti metallization structure of integrated circuits
18. Plasma-deposited silicon oxide and silicon nitride films on poly(ethylene terephthalate): A multitechnique study of the interphase regions
19. XPS and FTIR analysis of nitrogen incorporation in CNx thin films
20. The determination of phases formed in AlSiCu/TiN/Ti contact metallization structure of integrated circuits by x-ray diffraction
21. Effect of the Ti/TiN bilayer barrier and its surface treatment on the reliability of a Ti/TiN/AlSiCu/TiN contact metallization
22. Effect of the oxidation of TiN on the stability of the Al/TiN interface
23. The effect of an oxygen plasma exposure on the reliability of a Ti/TiN contact metallization
24. Positron study of plasma-enhanced chemical vapor deposited silicon nitride films
25. Backside gettering of Cu by porous Si
26. Photosensitivity in phosphorus‐doped silica glass and optical waveguides
27. Remote oxygen‐containing hydrogen plasma treatment of porous silicon
28. Characterization of reactively evaporated TiN layers for diffusion barrier applications
29. Local order and H-bonding in N-rich amorphous silicon nitride
30. The use of elastic recoil detection for stoichiometry determination of reactively evaporated TiN layers
31. Etching of a‐C:H films by an atomic oxygen beam
32. Effect of rapid thermal annealing on both the stress and the bonding states of a-SiC:H films
33. Hydrogen profiling by elastic recoil detection in microcrystalline germanium thin films
34. Mechanical properties of silicon carbide films for X-ray lithography application
35. Characterization ofa‐SiC:H films produced in a standard plasma enhanced chemical vapor deposition system for x‐ray mask application
36. A study of the effect of composition on the microstructural evolution of a–SixC1−x: H PECVD films: IR absorption and XPS characterizations
37. Preparation and Chemical Investigation of Porous Silicon
38. Optical properties and chemical reactivity of hydrogenated amorphous boron thin films
39. Caractérisation des dispositifs photovoltaïques au a-Si:H
40. Characterization of Lead Zirconate Titanate (PZT) - Indium Tin Oxide (ITO) Thin Film Interface
41. Structure ofPm141from decay ofN=79Sm141
42. Structure of140Pm from beta decay of140Sm
43. Silicon nitride from microwave plasma: fabrication and characterization
44. Search for a 11/2??3/2+ M 4 transition in141Sm
45. Structure of even-even138Nd from the decay of138Pm
46. The Decay of 95Rh to Levels of 95Ru
47. Structure ofSm142from the decay ofEu142
48. The decay of96Rhmand96Rhg
49. Nondestructive surface analysis by nuclear scattering techniques
50. The Mass Excesses of 91Tc and 90Tc
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