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1. Influence of lithography process parameter on DICD and taper of photoresist

Author

LIU Dan, 刘 丹, primary, CHEN Qi-chao, 陈启超, additional, HUANG Sheng, 黄 晟, additional, QIN Gang, 秦 刚, additional, GAO Peng-peng, 高朋朋, additional, CHEN Hao, 陈 昊, additional, CAI Xiao-rui, 蔡晓锐, additional, WANG Bai-qiang, 王百强, additional, FENG Jia-hai, 冯家海, additional, and FANG Liang, 方 亮, additional

Published
2019
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