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1. Stability Control of Composition of RF-Sputtered Pb(Zr, Ti)O3Ferroelectric Thin Film

Author

Suu, Koukou, Osawa, Akira, Yutaka Nishioka, Yutaka Nishioka, and Noriaki Tani, Noriaki Tani

Abstract

The process stability of Pb(Zr, Ti)O3(PZT) sputtering was studied by observing film composition change as a function of the process duration (e.g.integrating sputtering time). A useful method of controlling compositional stability was developed. It was found that the existence of a potentially grounded anode was effective to prevent the large variation of Pb contents in PZT thin films and improve the process stability of PZT sputtering.

Published
1997
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