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4 results on '"Kouji Suzuki"'

2. Temporomandibular Disorder Subcategorization and Patient Complaints Detected by a Self-administered Questionnaire.

Author

Kouji, Suzuki, Kenji, Maekawa, Takuo, Kuboki, and Hirofumi, Yatani

Subjects
TEMPOROMANDIBULAR disorders, HEADACHE, SYMPTOMS, MASTICATORY muscles, BACKACHE
Abstract

The article focuses on the relationship between temporomandibular disorder (TMD) sub-categorization and patient's complaints. It mentions that TMD patients often complain of various accompanying symptoms including headache, shoulder stiffness, of low back pain, in addition to masticatory muscle and TMJ-related TMD symptoms. Further, the classification of TMD patients according to a masticatory muscle-and TMJ-related TMD sub-categorization system is also offered.

Published
2002
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3. Low Incidence of Osteonecrosis in Childhood Acute Lymphoblastic Leukemia Treated with ALL-97 and ALL-02 Study of Japan Association of Childhood Leukemia Study Group

Author

Sakamoto, Kenichi, Imamura, Toshihiko, Kihira, Kentaro, Ishida, Hisashi, Kouji, Suzuki, Morita, Hiromi, Miyako, Kanno, Mori, Takeshi, Hiramatsu, Hidefumi, Matsubara, Kousaku, Terui, Kiminori, Takahashi, Yoshihiro, Suenobu, So-ichi, Hasegawa, Daiichiro, Kosaka, Yoshiyuki, Kato, Koji, Akiko, Saito-Moriya, Sato, Atsushi, Kawasaki, Hirohide, Yagi, Keiko Yumura, Hara, Jun-ichi, Hori, Hiroki, and Horibe, Keizo

Abstract

Purpose: Osteonecrosis (ON) is a serious complication of the treatment of childhood acute lymphoblastic leukemia (ALL). The incidence of ON varies (range, 2.0-18.0%) according to treatment strategy. Previous studies reported older age, female sex, dosage of corticosteroid, use of dexamethasone (DEX), combination therapy with DEX and L-asparaginase (L-Asp), and ethnicity were putative risk factors. However, most of these studies were mainly conducted in U.S.A. or European countries. Thus, the data relating to ON in Asian ALL patients are scarce. Herein, we performed a retrospective analysis of Japanese ALL patient cohorts uniformly treated with consecutive two clinical trials (ALL-97 and ALL-02) to clarify the incidence, clinical characteristics and risk factors of ON.

Published
2017
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4. Photolithographic Pattern Transformation by Backside Exposure in a-Si:H Thin-Film Transistor Liquid Crystal Displays

Author

Uchikoga, Shuichi, Hiromasu, Yasunobu, Onozuka, Yutaka, Koizumi, Takashi, Akiyama, Masahiko, Ikeda, Mitsushi, and Kouji Suzuki, Kouji Suzuki

Abstract

Resist pattern transformation by backside exposure, which is a key process for a self-alignment technique is investigated. The light intensity and a-Si:H thickness markedly affect the pattern transformation, while the effect of gate insulator thickness is small. Numerical simulations based on Fresnel diffraction showed fairly good agreement with the experimental results.

Published
1995
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