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Ti1-xAlxN films were prepared using a dynamic ion mixing apparatus with two electron beam evaporation sources. The Ti and Al contents of the films were changed by independent control of the evaporation rates of the two sources at a constant N concentration of 30 at%. The chemical shifts of the films determined by X-ray photoelectron spectroscopy (XPS) were smaller than those of the standard TiN and AlN, because one N atom combined with a Ti and an Al atom. The hardness and wear resistance of the Ti1-xAlxN films were determined, and it was found that an increase in the Al content of the films resulted in a decrease in the hardness and the wear resistance. The hardness and wear resistance changed drastically with change in xfrom 0.5 to 0.64 despite no such changes of XPS and X-ray diffraction (XRD). It was obvious from SEM images that the film with x=0.5 had a results of denser cross-sectional structure and a smoother surface than the film with x=0.64. From the results of mechanical tests, the optimum composition for a film having excellent mechanical properties was concluded to be (Ti0.5Al0.5)N0.3.