Author: "Muralidharan, Rangarajan" / Database: SciTech Connect - Searchworks@Jio Institute Digital Library Search Results

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1. Comparative study of GaN mesa etch characteristics in Cl{sub 2} based inductively coupled plasma with Ar and BCl{sub 3} as additive gases

Author: Muralidharan, Rangarajan [Solid State Physics Laboratory, Lucknow Road, Timarpur, Delhi-110054 (India)]
Published: 2014
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