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Supplementary Material 2

Supplementary Material 1

Gastric cancer (GC) is the third-leading cause of cancer mortality worldwide. The aim of this study was to develop a nomogram that estimates 1-year, 3-year, and 5-year survival probability of GC patients after D2 gastrectomy combined with adjuvant chemotherapy. The results showed that median age is 58 (range: 18-85) years in the training cohort and 59 (range: 32-85) years in the validation cohort. On multivariate analysis, four factors were found to be significantly associated with worse overall survival (OS): late TNM stage, positive resection margin, preoperative carcinoembryonic antigen (CEA) level, and single chemotherapy regimens compared with multiple chemotherapy regimens. All of these findings were validated in the validation cohort. Furthermore, the four factors were included in the final nomogram for the prediction of 1-year, 3-year, and 5-year survival probability, with accurate calibration and reasonable discrimination (C-index = 0.676 for training cohort, and C-index = 0.664 for validation cohort). The AUC values analyzed by the ROC analysis demonstrated a good predictive accuracy of the nomogram for OS (1-year, 3-year, and 5-year OS were 94.43%, 77.42%, and 73.03% in the training cohort, respectively; 96.95%, 81.54%, and 73.41% in the validation cohort, respectively). In conclusion, the proposed nomogram may be used to objectively and accurately predict survival probability of GC patients in a multi-institutional clinical setting.

When UV-Nanoimprint Lithography(NIL) is used in manufacturing gratings of Distributed Feedback Laser Diodes(DFB LDs),the resist often turns into a high polymer after curing and can not be eliminated completely.To eliminate the residual resist,a multi-mask layer process was demonstrated.In this process,a 50 nm SiO2 hard mask was deposited between the wafer and the UV-curable resist and then traditional nanoimprint lithography based on soft stamp UV-imprinting was executed.Following that,the Inductively Coupled Plasma(ICP) dry etching was used to transfer the pattern on the substrate.Finally,it was rinsed with Buffered Oxide Etchant(BOE)for a few seconds.The effect of etching time on the duty ratio of grating was explored and the grating morphologies processed by traditional method and proposed method were compared.A scanning electron microscope image of rinsed grating shows that the grating with about 240 nm pitch and 82 nm depth offers a clean surface and a good feature.Therefore.The proposed method not only can eliminate the residual resist effectively but also can avoid the morphologic damage.

A three-dimensional optical switch is introduced which is composed of two N×N three-dimensional multi-mode interference couplers and an array of phase shift waveguide.Firstly,the general imaging principle of three dimensional multimode interference is analyzed by the guided-mode propagation method,and the imaging position and phase matrix are deduced.And the transmission equation of optical switch is set up by the transmission matrix method.The phase condition when the optical switch works is calculated by the transmission equation,and verification and the simulation is completed by three-dimensional finite-difference beam propration method.The insertion loss and crosstalk when the optical switch works are given,and the relation between the output power and the phase shift of phase array waveguide are obtained.

Four-channel monolithically integrated index-coupled distributed-feedback laser array has been fabricated using nanoimprint technology for 1.3 μm CWDM system. Selective lasing wavelength with 20 nm wavelength space is obtained. The present results show that the nanoimprint technology is mature and reliable in the fabrication of DFB laser array.