1. Comparative study of image contrast in scanning electron microscope and helium ion microscope
- Author
-
Cornelia Rodenburg, Daniel Fox, Yang-Bo Zhou, Hongzhou Zhang, Jing Jing Wang, Ying Chen, Pierce Maguire, and R. F. O'Connell
- Subjects
inorganic chemicals ,Histology ,Materials science ,Microscope ,Silicon ,Scanning electron microscope ,Physics::Medical Physics ,chemistry.chemical_element ,02 engineering and technology ,01 natural sciences ,Secondary electrons ,Pathology and Forensic Medicine ,law.invention ,Optics ,law ,0103 physical sciences ,Environmental scanning electron microscope ,010302 applied physics ,Conventional transmission electron microscope ,business.industry ,021001 nanoscience & nanotechnology ,chemistry ,Electron microscope ,0210 nano-technology ,business ,Field ion microscope - Abstract
Images of Ga+ -implanted amorphous silicon layers in a 110 n-type silicon substrate have been collected by a range of detectors in a scanning electron microscope and a helium ion microscope. The effects of the implantation dose and imaging parameters (beam energy, dwell time, etc.) on the image contrast were investigated. We demonstrate a similar relationship for both the helium ion microscope Everhart-Thornley and scanning electron microscope Inlens detectors between the contrast of the images and the Ga+ density and imaging parameters. These results also show that dynamic charging effects have a significant impact on the quantification of the helium ion microscope and scanning electron microscope contrast.
- Published
- 2017