1. Electromagnetic Metrology for NEMS
- Author
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Jie Chen, Ling Hao, and John Gallop
- Subjects
Nanoelectromechanical systems ,Microscope ,Materials science ,microwave ,graphene ,nanoscale electromagnetic metrology ,01 natural sciences ,Engineering physics ,law.invention ,Metrology ,010309 optics ,NEMS ,Resonator ,Microwave imaging ,law ,visual_art ,0103 physical sciences ,Electronic component ,visual_art.visual_art_medium ,NSMM ,010306 general physics ,Microwave ,Electronic circuit - Abstract
This paper outlines how demands on electromagnetic metrology have developed over recent years with the continuing reduction in the typical length scale of electronic components and circuits. In addition novel materials, especially 2D self-supporting structures such as graphene, have properties quite unlike conventional systems. At the nanoscale radical changes occur in techniques required and even in the physical quantities measured. This paper focusses on the example of a nearfield scanning microwave microscope and its application to nanoelectromechanical system resonators to illustrate these changes and challenges. UK NMS Program; EPSRC
- Published
- 2018