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18 results on '"Chalupsky, J."'

1. Single-shot damage of Ru thin film induced by FEL fs pulses

Author

Igor Milov, Igor Alexandrovich Makhotkin, Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., Gosse de Vries, Scholze, F., Siewert, F., Störmer, M., Robbert van de Kruijs, Keim, E. G., Wolferen, Hendricus A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., Saksl, K., Faatz, B., Keitel, B., Ploenjes, E., Schreiber, S., Toleikis, S., Loch, R. A., Hermann, M., Strobel, S., Nienhuys, H., Eric Louis, Frederik Bijkerk, and XUV Optics

Subjects
METIS-318793
Published
2016

2. Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses

Author

Igor Milov, Igor Alexandrovich Makhotkin, Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., Gosse de Vries, Scholze, F., Siewert, F., Störmer, M., Robbert van de Kruijs, Keim, R., Wolferen, Hendricus A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., Saksl, K., Faatz, B., Keitel, B., Ploenjes, E., Schreiber, S., Toleikis, S., Loch, R., Hermann, M., Strobel, S., Nienhuys, H., Eric Louis, Frederik Bijkerk, and XUV Optics

Subjects
METIS-318790
Published
2016

3. Emission Spectroscopy from an XUV Laser Irradiated Solid Target

Author

Dzelzainis, TWJ, Khattak, FY, Nagler, B, Vinko, S, Whitcher, T, Nelson, AJ, Lee, RW, Bajt, S, Toleikis, S, Faeustlin, R, Tschentscher, T, Juha, L, Kozlova, M, Chalupsky, J, Hajkova, V, Krzywinski, J, Soberierski, R, Jurek, M, Fajardo, M, Rosmej, FB, Heinmann, P, Wark, JS, and Riley, D

Published
2016

4. Multiple pulse damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Author

Sobierajski, R., Loch, R.A., Louis, Eric, Klinger, D., Dluizewski, P., Klepka, M., Bijkerk, Frederik, Burian, T., Chalupsky, J., Coppola, N., Dastjani Farahani, S., Galasso, G., Hajkova, V., Harmand, M., Krzywinski, J., Juha, L., Jurek, M., Möller, S., Nagasono, M., Ozkan, C., Pelka, J.B., Saskl, K., Schulz, J., Sovak, P., Toleikis, S., Tiedtke, K., Vysin, L., Wawro, A., Gaudin, J., and XUV Optics

Subjects
METIS-299691
Published
2013

5. Damage of multilayer optics under irradiation with multiple femtosecond XUV pulses

Author

Sobierajski, R., Loch, R.A., Klinger, D., Dluzewski, P., Klepka, M., Burian, T., Chalupsky, J., Visin, L., Farahani, S.D., Hajkova, V., Harmand, M., Krzywinski, J., Juha, L., Jurek, M., Möller, S., Nagasono, M., Ozkan, C., Saskl, K., Sinn, H., Sovak, P., Toleikis, S., and Gaudin, J.

Subjects
METIS-298895
Published
2012

6. Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers

Author

Loch, R.A., Sobierajski, R., Bostedt, C., Bozek, J., Burian, T., Chalupsky, J., Gaudin, J., Graf, A., Grzonka, J., Hajkova, V., Hau-Riege, S., van Hattum, E.D., Juha, L., Kllinger, D., Krzywinski, J., London, R.A., Louis, Eric, Messerschmidt, M., Moeller, S., Plocinski, T., Wawro, A., Zabierowski, P., Bijkerk, Frederik, and Laser Physics & Nonlinear Optics

Subjects
METIS-294426
Abstract

Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optical surface is a possible limitation. Therefore, resistivity studies of MoSi multilayers for different wavelengths were carried out at FLASH and LCLS. The results show that the leading damage mechanism is melting of the amorphous silicon layers, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent and is related to the absorbed energy density.

Published
2012

7. TOF-OFF: A method for determining focal positions in tightly focused free-electron laser beams by measuring ion energies off a surface

Author

Iwan, B, Andreasson, J, Andrejczuk, A, Abreu, E, Bergh, M, Caleman, C, Nelson, A. J, Bajt, S, Chalupsky, J, Chapman, H. N, Fxe4ustlin, R. R, Hajkova, V, Heimann, P. A, Hjxf6rvarsson, B, Juha, L, Klinger, D, Krzywinski, J, Nagler, B, Palsson, G. K, Singer, W, Seibert, M. M, Sobierajski, R, Toleikis, S, Tschentscher, T, Vinko, S. M, Lee, R. W, and Hajdu, J, Timneanu, N

Published
2011

8. Observation of K-Shell Soft X Ray Emission of Nitrogen Irradiated by XUV-Free Electron Laser FLASH at Intensities Greater than 10(16) W/cm(2)

Author

Galtier, E., Rosmej, Frank, Wark, J., Nagler, B., Lee, R. W., Nelson, A. J., Toleikis, S., Spatschek, K. H., Renner, O., Juha, L., Chalupsky, J., Gauthier, J.-C., White, S., Riley, D., Vinko, S., and Witcher, T.

Subjects
Free electron model, Materials science, Free-electron laser, Electron shell, Electron, Photon energy, Condensed Matter Physics, Laser, law.invention, law, ddc:570, Extreme ultraviolet, Atomic physics, Absorption (electromagnetic radiation)
Abstract

In the past few years, the development of light sources of the 4th generation, namely XUV/X-ray Free Electron Lasers provides to the scientific community outstanding tools to investigate matter under extreme conditions never obtained in laboratories so far. As theory is at its infancy, the analysis of matter via the self-emission of the target is of central importance. The characterization of such dense matter is possible if photons can escape the medium. As the absorption of K-shell X-ray transitions is minimal, it plays a key role in this study. We report here the first successful observation of K-shell emission of Nitrogen at 430 eV using an XUV-Free Electron Laser to irradiate solid Boron Nitride targets under exceptional conditions: photon energy of 92 eV, pulse duration of ∼20 fs, micro focusing leading to intensities larger than 1016 W/cm2. Using a Bragg crystal of THM coupled to a CCD, we resolved K-shell line emission from different charge states. We demonstrate that the spectroscopic data allow characterization of electron heating processes when X-ray radiation is interacting with solid matter. As energy transport is non-trivial because the light source is monochromatic, these results have an important impact on the theory. © 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim.

Published
2011
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9. Damage mechanisms in Mo/Si multilayer optics for short-wavelengths FELs

Author

Loch, R. A., Sobierajski, R., Bostedt, C., Bozek, J., Bruijn, S., Burian, T., Castagna, J. C., Chalupsky, J., Feng, Y., Gaudin, J., Graf, A., Hajkova, V., Hattum, E. D., Hau-Riege, S., Robbert van de Kruijs, Klinger, D., Krzywinski, J., Jastrow, U., Juha, L., Eric Louis, Messerschmidt, M., Moeller, S., Tiedtke, K., Frederik Bijkerk, Laser Physics & Nonlinear Optics, and Discrete Mathematics and Mathematical Programming

Subjects
METIS-270310
Published
2010

10. Damage studies of multilayer optics for XUV FELs

Author

Louis, Eric, Khorsand, A.R., Sobierajski, R., van Hattum, E.D., Tsarfati, T., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Jastrow, U., Toleikis, S., Wabnitz, H., Tiedtke, K., Gaudin, J., Bijkerk, Frederik, and Laser Physics & Nonlinear Optics

Subjects
METIS-270315
Published
2010

11. Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Author

Khorsand, A.R., Sobierajski, R., Louis, E., Bruijn, S., Van Hattum, E.D., Vande Kruijs, R.W.E., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Burian, T., Chalupsky, J., Cihelka, J., Hajkova, V., Vysin, L., Jastrow, U., Stojanovic, Nenad, Toleikis, S., Wabnitz, H., Tiedtke, K., Sokolowski-Tinten, Klaus, Shymanovich, Uladzimir, Krzywinski, J., Riege Hau, S., London, R., Gleeson, A., Gullikson, E.M., Bijkerk, F., van de Kruijs, R. W. E., Hau-Riege, S., Faculty of Science and Technology, XUV Optics, and Laser Physics & Nonlinear Optics

Subjects
Silicon, Materials science, Ultraviolet Rays, chemistry.chemical_element, law.invention, Optics, Optical microscope, law, Materials Testing, Thin film, Reflectometry, Molybdenum, business.industry, Optical Devices, Membranes, Artificial, Equipment Design, Nanosecond, Physik (inkl. Astronomie), Laser, Atomic and Molecular Physics, and Optics, Equipment Failure Analysis, chemistry, Extreme ultraviolet, business, Ultrashort pulse
Abstract

We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources. (C)2010 Optical Society of America

Published
2010

12. Damage studies of multilayer optics for XUV free electron lasers

Author

Louis, Eric, Khorsand, A.R., Sobierajski, R., van Hattum, E.D., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Jastrow, U., Toleikis, S., Wabnitz, H., Tiedtke, K., Gaudin, J., Gullikson, E.M., Bijkerk, Frederik, Juha, Libor, Bajt, Saša, Sobierajski, Ryszard, and Laser Physics & Nonlinear Optics

Subjects
Free electron model, business.industry, Chemistry, Free-electron laser, Laser, law.invention, Optics, Optical microscope, law, METIS-266557, Extreme ultraviolet, Femtosecond, Radiation damage, High-resolution transmission electron microscopy, business
Abstract

We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.

Published
2009
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13. Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle

Author

Chalupsky, J., Hajkova, V., Altapova, V., Burian, T., Gleeson, A.J., Juha, L., Jurek, M., Sinn, H.Stoermer, M., Sobierajski, R., Tiedtke, K., Toleikis, S., Tschentscher, T., Vysin, L., Wabnitz, H., and Gaudin, J.

Abstract

We present results of damage studies conducted at the Free Electron LASer in Hamburg (FLASH) facility with 13.5 nm (91.8 eV) and 7 nm (177.1 eV) radiations. The laser beam was focused on a sample of 890-nm-thick amorphous carbon coated on a silicon wafer mimicking a x-ray mirror. The fluence threshold for graphitization was determined for different grazing angles above and below the critical angle. The observed angular dependence of Fth is explained by the variation in absorption depth and reflectivity. Moreover, the absorbed local dose needed for the phase transition leading to graphitization is shown to vary with the radiation wavelength.

Published
2009
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14. Comparative damage studies in multilayer optics induced by intense short-wavelength pulses from FLSH and LCLS

Author

Loch, R. A., Sobierajski, R., Bostedt, C., Bruijn, S., Burian, T., Chalupsky, J., Feng, Y. C., Gaudin, J., Graf, A., Hattum, E. D., Hau-Riege, S., Juha, L., Khorsand, A. R., Klinger, D., Robbert van de Kruijs, Krzywinski, J., London, R., Eric Louis, Messerschmidt, M., Moeller, S., Schlotter, W., Tiedtke, K., Frederik Bijkerk, and Laser Physics & Nonlinear Optics

Subjects
METIS-277884

15. Focusing of millijoule picosecond K-alpha radiation from 100 TW laser-solid interaction

Author

Levy, A., Dorchies, F., patrick Audebert, Chalupsky, J., Hájková, V., Juha, L., Kaempfer, T., Sinn, H., Uschmann, I., Vysin, L., Gaudin, J., ONERA - The French Aerospace Lab [Châtillon], ONERA-Université Paris Saclay (COmUE), Centre d'Etudes Lasers Intenses et Applications (CELIA), Université de Bordeaux (UB)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Laboratoire pour l'utilisation des lasers intenses (LULI), Université Pierre et Marie Curie - Paris 6 (UPMC)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Institute of Physics (PALS), Czech Academy of Sciences [Prague] (CAS), Czech Technical University in Prague (CTU), Advanced Photon Source [ANL] (APS), Argonne National Laboratory [Lemont] (ANL)-University of Chicago-US Department of Energy, X-ray Optics Croup Institute of Optics and Quantum Electronics, Friedrich-Schiller-Universität = Friedrich Schiller University Jena [Jena, Germany], Airbus Group Innovations [Suresnes], Airbus [France], and Centre National de la Recherche Scientifique (CNRS)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Bordeaux (UB)

Subjects
[PHYS]Physics [physics], ComputingMilieux_MISCELLANEOUS
Abstract

International audience; no abstract

16. Achieving microfocus of the 13.5-NM flash beam for exploring matter under extreme conditions

Author

Nelson, A. J., Lee, R. W., Toleikis, S., Sasa Bajt, Fäustlin, R. R., Chapman, H., Krzywinski, J., Chalupsky, J., Juha, L., Hajkova, V., Nagler, B., Vinko, S. M., Whitcher, T., Wark, J. S., Dzelzainis, T., Riley, D., Saksl, K., Khorsand, A. R., Sobierajski, R., Jurek, M., Andreasson, J., Timneanu, N., Hadju, J., Fajardo, M., and Tschentscher, T.

Abstract

We have focused a beam (BL3) of FLASH (Free-electron LASer in Hamburg: δ=13.5 nm, pulse length 15 fs, pulse energy 10-40 μJ, 5Hz) using a fine polished off-axis parabola having a focal length of 270 mm and coated with a Mo/Si multilayer with an initial reflectivity of 67% at 13.5 nm. The OAP was mounted and aligned with a picomotor controlled six-axis gimbal. Beam imprints on poly(methyl methacrylate) - PMMA were used to measure focus and the focused beam was used to create isochoric heating of various slab targets. Results show the focal spot has a diameter of ≤1 μm producing intensities greater than 1016 W cm-2. Observations were correlated with simulations of best focus to provide further relevant information. This focused XUV laser beam now allows us to begin exploring matter under extreme conditions.

17. Radiation emission of autoionising hole states of Al induced by XUV free electron laser radiation with FLASH at DESY

Author

Galtier, E., Rosmej, F. B., Riley, D., Dzelzainis, T., Heinmann, P., Khattak, F. Y., Lee, R. W., Nagler, B., Nelson, A., Tschentscher, T., Vinko, S. M., Whitcher, T., Toleikis, S., Fäustlin, R., Juha, L., Marta Fajardo, Wark, J. S., Chalupsky, J., Hajkova, V., Krzywinski, J., Soberierski, R., Jurek, M., and Kozlova, M.

Abstract

The analysis of the radiative properties of plasmas created by XUV and X-ray free electron laser radiations provides a tremendous challenge to researchers to investigate matter under extreme conditions. In the present work we report about the theoretical analysis of the radiation emission of Al heated by the interaction of 10 fs focused (1 μm) free electron laser radiation at 13.5 nm at intensities of about 1016 W/cm2. The data show strong resonance line emission 3l -2l′ from Ne-like Al but also numerous intense broad emission structures in the spectral range from 10-30 nm. Atomic structure analysis indicate that these emission structures might originate from multiple excited states with L-holes. By means of a genetic algorithm we analyze possible excitation channels driven directly by the FLASH free electron laser as well as by heated plasma electrons.

18. Direct LiF imaging diagnostics on refractive X-ray focusing at the EuXFEL High Energy Density instrument

Author

Sergey Makarov, Mikako Makita, Motoaki Nakatsutsumi, Tatiana Pikuz, Norimasa Ozaki, Thomas R. Preston, Karen Appel, Zuzana Konopkova, Valerio Cerantola, Erik Brambrink, Jan-Patrick Schwinkendorf, Istvan Mohacsi, Tomas Burian, Jaromir Chalupsky, Vera Hajkova, Libor Juha, Vojtech Vozda, Bob Nagler, Ulf Zastrau, Sergey Pikuz, Makarov, S, Makita, M, Nakatsutsumi, M, Pikuz, T, Ozaki, N, Preston, T, Appel, K, Konopkova, Z, Cerantola, V, Brambrink, E, Schwinkendorf, J, Mohacsi, I, Burian, T, Chalupsky, J, Hajkova, V, Juha, L, Vozda, V, Nagler, B, Zastrau, U, and Pikuz, S

Subjects
Nuclear and High Energy Physics, Radiation, X-ray beam characterization, X-ray free-electron laser, lithium fluoride (LiF) detector, Instrumentation, compound refractive lense, focusing system, X-ray focusing
Abstract

The application of fluorescent crystal media in wide-range X-ray detectors provides an opportunity to directly image the spatial distribution of ultra-intense X-ray beams including investigation of the focal spot of free-electron lasers. Here the capabilities of the micro- and nano-focusing X-ray refractive optics available at the High Energy Density instrument of the European XFEL are reported, as measured in situ by means of a LiF fluorescent detector placed into and around the beam caustic. The intensity distribution of the beam focused down to several hundred nanometers was imaged at 9 keV photon energy. A deviation from the parabolic surface in a stack of nanofocusing Be compound refractive lenses (CRLs) was found to affect the resulting intensity distribution within the beam. Comparison of experimental patterns in the far field with patterns calculated for different CRL lens imperfections allowed the overall inhomogeneity in the CRL stack to be estimated. The precise determination of the focal spot size and shape on a sub-micrometer level is essential for a number of high energy density studies requiring either a pin-size backlighting spot or extreme intensities for X-ray heating.

Published
2023

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