1. Quasiepitaxial Aluminum Film Nanostructure Optimization for Superconducting Quantum Electronic Devices
- Author
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Shadrin, Mikhail Tarasov, Andrey Lomov, Artem Chekushkin, Mikhail Fominsky, Denis Zakharov, Andrey Tatarintsev, Sergey Kraevsky, and Anton
- Subjects
nanoelectronics ,Josephson junctions ,nanodevices ,crystal structure ,epitaxial films ,surface roughness ,tunnel junctions - Abstract
In this paper, we develop fabrication technology and study aluminum films intended for superconducting quantum nanoelectronics using AFM, SEM, XRD, HRXRR. Two-temperature-step quasiepitaxial growth of Al on (111) Si substrate provides a preferentially (111)-oriented Al polycrystalline film and reduces outgrowth bumps, peak-to-peak roughness from 70 to 10 nm, and texture coefficient from 3.5 to 1.7, while increasing hardness from 5.4 to 16 GPa. Future progress in superconducting current density, stray capacitance, relaxation time, and noise requires a reduction in structural defect density and surface imperfections, which can be achieved by improving film quality using such quasiepitaxial growth techniques.
- Published
- 2023
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