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2. Thin film nanostructuring at oblique angles by substrate patterning

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico Gavira, Victor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico Gavira, Victor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.

Published
2022

3. Thin film nanostructuring at oblique angles by substrate patterning

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.

Published
2022

4. Thin film nanostructuring at oblique angles by substrate patterning

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.

Published
2022

5. Thin film nanostructuring at oblique angles by substrate patterning

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.

Published
2022

6. Thin film nanostructuring at oblique angles by substrate patterning

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico-Gavira, Víctor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.

Published
2022

7. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

8. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

9. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

10. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

11. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

12. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael

Published
2021

13. Growth of nanocolumnar thin films on patterned substrates at oblique angles

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.

Published
2019

14. Presentación del prototipo final a la Competición 'Chem-E-Car' en el 10º Congreso Mundial de Ingeniería Química

Author

Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, Sancho González, Luis, Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, and Sancho González, Luis

Abstract

El proyecto consistió en la presentación del prototipo Chem-E-Car desarrollado en la UCM en la competición mundial que se celebró durante el transcurso del Congreso Mundial de Ingeniería Química (Barcelona, 30 septiembre-2 de octubre de 2017).

Published
2019

15. Growth of nanocolumnar thin films on patterned substrates at oblique angles

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.

Published
2019

16. Growth of nanocolumnar thin films on patterned substrates at oblique angles

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.

Published
2019

17. Presentación del prototipo final a la Competición 'Chem-E-Car' en el 10º Congreso Mundial de Ingeniería Química

Author

Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, Sancho González, Luis, Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, and Sancho González, Luis

Abstract

El proyecto consistió en la presentación del prototipo Chem-E-Car desarrollado en la UCM en la competición mundial que se celebró durante el transcurso del Congreso Mundial de Ingeniería Química (Barcelona, 30 septiembre-2 de octubre de 2017)., The project consisted of the presentation of the Chem-E-Car prototype developed at the UCM in the world competition held during the World Congress of Chemical Engineering (Barcelona, September 30-October 2, 2017).

Published
2019

18. Growth of nanocolumnar thin films on patterned substrates at oblique angles

Author

Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico-Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto

Abstract

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.

Published
2019

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