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A Ga focused ion beam (FIB) is often used in transmission electron microscopy (TEM) analysis sample preparation. In case of a crystalline Si sample, an amorphous near-surface layer is formed by the FIB process. In order to optimize the FIB recipe by minimizing the amorphization, it is important to predict the amorphous layer thickness from simulation. Molecular Dynamics (MD) simulation has been used to describe the amorphization, however, it is limited by computational power for a realistic FIB process simulation. On the other hand, Binary Collision Approximation (BCA) simulation is able and has been used to simulate ion-solid interaction process at a realistic scale. In this study, a Point Defect Density approach is introduced to a dynamic BCA simulation, considering dynamic ion-solid interactions. We used this method to predict the c-Si amorphization caused by FIB milling on Si. To validate the method, dedicated TEM studies are performed. It shows that the amorphous layer thickness predicted by the numerical simulation is consistent with the experimental data. In summary, the thickness of the near-surface Si amorphization layer caused by FIB milling can be well predicted using the Point Defect Density approach within the dynamic BCA model., (Copyright © 2017 Elsevier B.V. All rights reserved.)

Electron holography is the highest resolving tool for dopant profiling at nanometre-scale resolution. In order to measure the object areas of interest in a hologram, both a wide field of view and a sufficient lateral resolution are required. The usual path of rays for recording holograms with an electron biprism using the standard objective lens does not meet these requirements, because the field of view amounts to some 10 nm only, however, at a resolution of 0.1 nm better than needed here. Therefore, instead of the standard objective lens, the Lorentz lens is widely used for holography of semiconductors, since it provides a field of view up to 1000 nm at a sufficient lateral resolution of about 10nm. Since the size of semiconductor structures is steadily shrinking, there is now a need for better lateral resolution at an appropriate field of view. Therefore, additional paths of rays for recording holograms are studied with special emphasis on the parameters field of view and lateral resolution. The findings allow an optimized scheme with a field of view of 200 nm and a lateral resolution of 3.3 nm filling the gap between the existing set-ups. In addition, the Lorentz lens is no longer required for investigation of non-magnetic materials, since the new paths of rays are realized with the standard objective lens and diffraction lens. An example proves the applicability of this arrangement for future semiconductor technology., (Copyright © 2010 Elsevier B.V. All rights reserved.)

Transmission electron microscopy (TEM) is a widely used tool for analysis of very large scale integrated (VLSI) semiconductor devices. As a special TEM-feature, off-axis electron holography obtains information about the electrical characteristics of a specimen, which are connected to the dopant concentration in the bulk material. Compared with conventional TEM, application of electron holography for dopant profiling demands a higher quality of specimen preparation, e.g. in terms of thickness homogeneity. Since preparation by means of focused ion beam (FIB) has become an industrial standard for TEM-investigations, its facilities are investigated for meeting the high holographic demands. It turned out that, besides many advantages like precision and speed, the use of FIB for preparation introduces new specific problems, e.g. it is hardly possible to visualize doped areas of semiconductors on a classical, thin FIB specimen. Additionally, some artifacts of FIB-preparation have no great importance for normal TEM analysis, but do significantly influence the results of holographic analysis. In order to satisfy the higher demands of preparation for holography, a special procedure for FIB-preparation has been newly developed.