Search

With the development of nanometer accuracy stitching interferometry, ion beam figuring (IBF) of x-ray mirrors can now be achieved with unprecedented performance. However, the process of producing x-ray diffraction gratings on these surfaces may degrade the figure quality due to process errors introduced during the ruling of the grating grooves. To address this challenge, we have investigated the post-production correction of gratings using IBF, where stitching interferometry is used to provide in-process feedback. A concern with ion beam correction in this case is that ions will induce enough surface mobility of atoms to cause smoothing of the grating structure and degradation of diffraction efficiency. In this study we found however that it is possible to achieve a nanometer-level planarity of the global grating surface with IBF, while preserving the grating structure. The preservation was so good, that we could not detect a change in the diffraction efficiency after ion beam correction. This is of major importance in achieving ultra-high spectral resolution, and the preservation of brightness for coherent x-ray beams.

We have designed and fabricated a high groove density blazed grating for a Resonant Inelastic X-ray Scattering spectrometer for the new Qerlin beamline at the Advanced Light Source (ALS) synchrotron facility. The gratings were fabricated using a set of nanofabrication techniques including e-beam lithography, nanoimprint, plasma etch, and anisotropic wet etching. Two gratings with groove density of 6000 lines/mm and 3000 lines/mm and optimized for operation in the 1 st and 2 nd negative diffraction order respectively were fabricated and tested. We report on fabrication details and characterization of the gratings at beamline 6.3.2 of the ALS.

We have developed a new method for the determination of photoabsorption at extreme ultraviolet wavelengths longer than 20 nm, where reliable refractive index values are sparse or non-existent. Our method overcomes the obstacle of multiple reflections that occur inside thin films in this spectral range, which up until now has prevented the accurate determination of photoabsorption from transmittance measurements. We have derived a mathematical expression that is independent of internal reflection amplitudes, while taking advantage of the transmittance oscillations stemming from such reflections. The method is validated on measurements of aluminum thin films. This advance will enable accurate refractive index values for many important materials for optical instrumentation, thus facilitating high-priority research on topics including coherent light sources, planetary and solar physics, and semiconductor manufacturing.

We have developed an advanced process for blaze angle reduction of x-ray gratings for the soft, tender, and EUV spectral ranges. The process is based on planarization of an anisotropically etched Si blazed grating followed by a chemically selective plasma etch. This provides a way to adjust the blaze angle to any lower value with high accuracy. Here we demonstrate the reduction of the blaze angle to an extremely low value of 0.04°±0.004°. For a 100 lines/mm grating with a Mo/Si multilayer coating, the grating exhibits diffraction efficiency of 58% in the 1 st diffraction order at a wavelength of 13.3 nm. This technique will be applicable to a wide range of uses of high efficiency gratings for synchrotron sources, as well as for Free Electron Lasers (FEL).

We demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.

Femtosecond (fs) x-ray pulses are a key tool to study the structure and dynamics of matter on its natural length and time scale. To complement radio-frequency accelerator-based large-scale facilities, novel laser-based mechanisms hold promise for compact laboratory-scale x-ray sources. Laser-plasma driven undulator radiation in particular offers high peak-brightness, optically synchronized few-fs pulses reaching into the few-nanometer (nm) regime. To date, however, few experiments have successfully demonstrated plasma-driven undulator radiation. Those that have, typically operated at single and comparably long wavelengths. Here we demonstrate plasma-driven undulator radiation with octave-spanning tuneability at discrete wavelengths reaching from 13 nm to 4 nm. Studying spontaneous undulator radiation is an important step towards a plasma-driven free-electron laser. Our specific setup creates a photon pulse, which closely resembles the plasma electron bunch length and charge profile and thus might enable novel methods to characterize the longitudinal electron phase space.

In this Letter, we have developed new and highly efficient periodic multilayer mirrors Al/Sc, Al/Sc/SiC, and Mo/Al/Sc with optimized reflectance at wavelengths between 40 and 65 nm. We have reached record values in measured peak reflectance: 57.5% at 44.7 nm and 46.5% at 51 nm, with Al/Sc/SiC at near-normal incidence. Furthermore, to the best of our knowledge, we have achieved the largest reported bandwidth with Mo/Al/Sc at 57 nm and the narrowest bandwidth with Al/Sc at a 60 nm wavelength. These new and promising results demonstrate that Al/Sc-based multilayer coatings are excellent candidates for future generations of extreme ultraviolet (EUV) instruments for solar physics, EUV lasers, and attosecond science, in a wavelength range that has not been fully explored.

This paper demonstrates that highly reflective Cr/B₄C multilayer interference coatings with nanometric layer thicknesses, designed to operate in the soft X-ray photon energy range, have stable reflective performance for a period of 3 years after deposition. The microstructure and chemical composition of layers and interfaces within Cr/B₄C multilayers is also examined, with emphasis on the B₄C-on-Cr interface where a significant diffusion layer is formed and on the oxide in the top B₄C layer. Multiple characterization techniques (X-ray reflectivity at different photon energies, X-ray photoelectron spectroscopy, transmission electron microscopy, electron diffraction and X-ray diffraction) are employed and the results reveal a consistent picture of the Cr/B₄C layer structure.

We have developed a method for the manufacture of x-ray diffraction gratings with arbitrarily small blaze angles. These gratings are made by a process in which a high blaze angle grating made by anisotropic etching of Si (111) is subjected to planarization and reactive ion etching. Differential etching of the planarization medium and silicon ensures reduction of the blaze angle. Repeated application of this process leads to gratings of increasing perfection with an arbitrarily small blaze angle. This opens the way to highly efficient low line density gratings, to damage resistant gratings for ultra-high power applications such as free electron lasers, and for extension of the use of gratings into the hard x-ray energy range for dispersive spectroscopy.

A process for fabrication of ultra-precise diffraction gratings for high resolution x-ray spectroscopy was developed. A grating pattern with constant or variable line spacing (VLS) is recorded on a quartz plate by use of e-beam lithography with nanometer scale accuracy of the groove placement. The pattern is transferred to a massive grating blank by large area nanoimprint followed by dry or/and wet etching for groove shaping. High fidelity of the nanoimprint transfer step was confirmed by differential wavefront measurements. Successful implementation of the suggested fabrication approach was demonstrated by fabrication of a lamellar 900 lines/mm VLS grating for a soft x-ray fluorescence spectrometer.

The influence of B 4 C incorporation during magnetron sputter deposition of Cr/Sc multilayers intended for soft X-ray reflective optics is investigated. Chemical analysis suggests formation of metal: boride and carbide bonds which stabilize an amorphous layer structure, resulting in smoother interfaces and an increased reflectivity. A near-normal incidence reflectivity of 11.7%, corresponding to a 67% increase, is achieved at λ = 3.11 nm upon adding 23 at.% (B + C). The advantage is significant for the multilayer periods larger than 1.8 nm, where amorphization results in smaller interface widths, for example, giving 36% reflectance and 99.89% degree of polarization near Brewster angle for a multilayer polarizer. The modulated ion-energy-assistance during the growth is considered vital to avoid intermixing during the interface formation even when B + C are added.

We employ X-ray absorption near-edge spectroscopy at the boron K-edge and the phosphorus L 2,3 -edge to study the structural properties of cubic boron phosphide (c-BP) samples. The X-ray absorption spectra are modeled from first-principles within the density functional theory framework using the excited electron core-hole (XCH) approach. A simple structural model of a perfect c-BP crystal accurately reproduces the P L 2,3 -edge, however it fails to describe the broad and gradual onset of the B K-edge. Simulations of the spectroscopic signatures in boron 1s excitations of intrinsic point defects and the hexagonal BP crystal phase show that these additions to the structural model cannot reproduce the broad pre-edge of the experimental spectrum. Calculated formation enthalpies show that, during the growth of c-BP, it is possible that amorphous boron phases can be grown in conjunction with the desired boron phosphide crystalline phase. In combination with experimental and theoretically obtained X-ray absorption spectra of an amorphous boron structure, which have a similar broad absorption onset in the B K-edge spectrum as the cubic boron phosphide samples, we provide evidence for the presence of amorphous boron clusters in the synthesized c-BP samples.

Over the past decade, the advances in grating-based soft X-ray spectrometers have revolutionized the soft X-ray spectroscopies in materials research. However, these novel spectrometers are mostly dedicated designs, which cannot be easily adopted for applications with diverging demands. Here we present a versatile spectrometer design concept based on the Hettrick-Underwood optical scheme that uses modular mechanical components. The spectrometer's optics chamber can be used with gratings operated in either inside or outside orders, and the detector assembly can be reconfigured accordingly. The spectrometer can be designed to have high spectral resolution, exceeding 10 000 resolving power when using small source (∼1μm) and detector pixels (∼5μm) with high line density gratings (∼3000 lines/mm), or high throughput at moderate resolution. We report two such spectrometers with slightly different design goals and optical parameters in this paper. We show that the spectrometer with high throughput and large energy window is particularly useful for studying the sustainable energy materials. We demonstrate that the extensive resonant inelastic X-ray scattering (RIXS) map of battery cathode material LiNi 1/3 Co 1/3 Mn 1/3 O 2 can be produced in few hours using such a spectrometer. Unlike analyzing only a handful of RIXS spectra taken at selected excitation photon energies across the elemental absorption edges to determine various spectral features like the localized dd excitations and non-resonant fluorescence emissions, these features can be easily identified in the RIXS maps. Studying such RIXS maps could reveal novel transition metal redox in battery compounds that are sometimes hard to be unambiguously identified in X-ray absorption and emission spectra. We propose that this modular spectrometer design can serve as the platform for further customization to meet specific scientific demands.

A dual-channel streaked soft x-ray imager has been designed and used on high energy-density physics experiments at the National Ignition Facility. This streaked imager creates two images of the same x-ray source using two slit apertures and a single shallow angle reflection from a nickel mirror. Thin filters are used to create narrow band pass images at 510 eV and 360 eV. When measuring a Planckian spectrum, the brightness ratio of the two images can be translated into a color-temperature, provided that the spectral sensitivity of the two images is well known. To reduce uncertainty and remove spectral features in the streak camera photocathode from this photon energy range, a thin 100 nm CsI on 50 nm Al streak camera photocathode was implemented. Provided that the spectral shape is well-known, then uncertainties on the spectral sensitivity limits the accuracy of the temperature measurement to approximately 4.5% at 100 eV.

A 2500 lines/mm Multilayer Blazed Grating (MBG) optimized for the soft x-ray wavelength range was fabricated and tested. The grating coated with a W/B 4 C multilayer demonstrated a record diffraction efficiency in the 2nd blazed diffraction order in the energy range from 500 to 1200 eV. Detailed investigation of the diffraction properties of the grating demonstrated that the diffraction efficiency of high groove density MBGs is not limited by the normal shadowing effects that limits grazing incidence x-ray grating performance. Refraction effects inherent in asymmetrical Bragg diffraction were experimentally confirmed for MBGs. The refraction affects the blazing properties of the MBGs and results in a shift of the resonance wavelength of the gratings and broadening or narrowing of the grating bandwidth depending on diffraction geometry. The true blaze angle of the MBGs is defined by both the real structure of the multilayer stack and by asymmetrical refraction effects. Refraction effects can be used as a powerful tool in providing highly efficient suppression of high order harmonics.

A new streaked soft x-ray imager has been designed for use on high energy-density (HED) physics experiments at the National Ignition Facility based at the Lawrence Livermore National Laboratory. This streaked imager uses a slit aperture, single shallow angle reflection from a nickel mirror, and soft x-ray filtering to, when coupled to one of the NIF's x-ray streak cameras, record a 4× magnification, one-dimensional image of an x-ray source with a spatial resolution of less than 90 μm. The energy band pass produced depends upon the filter material used; for the first qualification shots, vanadium and silver-on-titanium filters were used to gate on photon energy ranges of approximately 300-510 eV and 200-400 eV, respectively. A two-channel version of the snout is available for x-ray sources up to 1 mm and a single-channel is available for larger sources up to 3 mm. Both the one and two-channel variants have been qualified on quartz wire and HED physics target shots.

A graded and broadband Mo/Si multilayer mirror for EUV spectroscopy is demonstrated. This mirror has an average reflectivity profile of 16% in the wavelength region from 15 nm to 17 nm and an effective area of 1100-1500 mm(2). This reflectivity is about 4 times larger than that of a standard Mo/Si multilayer mirror on a 1 in. diameter substrate, showing that the mirror can be used for measuring EUV fluorescence at wavelengths in the region around 15 nm to 17 nm.

We describe a new in operando approach for the investigation of heterogeneous processes at solid/liquid interfaces with elemental and chemical specificity which combines the preparation of thin liquid films using the meniscus method with standing wave ambient pressure X-ray photoelectron spectroscopy [Nemšák et al., Nat. Commun., 5, 5441 (2014)]. This technique provides information about the chemical composition across liquid/solid interfaces with sub-nanometer depth resolution and under realistic conditions of solution composition and concentration, pH, as well as electrical bias. In this article, we discuss the basics of the technique and present the first results of measurements on KOH/Ni interfaces.

Imperfections in the multilayer stack deposited on a saw-tooth substrate are the main factor limiting the diffraction efficiency of extreme ultraviolet and soft x-ray multilayer-coated blazed gratings (MBGs). Since the multilayer perturbations occur in the vicinity of antiblazed facets of the substrates, reduction of the groove density of MBGs is expected to enlarge the area of unperturbed multilayer and result in higher diffraction efficiency. At the same time the grating should be optimized for higher-order operation in order to keep high dispersion and spectral resolution. In this work we show the validity of this approach and demonstrate significant enhancement of diffraction efficiency of MBGs using higher-order diffraction. A new record for diffraction efficiency of 52% in the second diffraction order was achieved for an optimized MBG with groove density of 2525  lines/mm at the wavelength of 13.4 nm.

A new small-angle scattering technique in reflection geometry is described which enables a topological study of rough surfaces. This is achieved by using long-wavelength soft X-rays which are scattered at wide angles but in the low-Q range normally associated with small-angle scattering. The use of nanometre-wavelength radiation restricts the penetration to a thin surface layer which follows the topology of the surface, while moving the scattered beam to wider angles preventing shadowing by the surface features. The technique is, however, only applicable to rough surfaces for which there is no specular reflection, so that only the scattered beam was detected by the detector. As an example, a study of the surfaces of rough layers of silicon produced by the deposition of nanoparticles by blade-coating is presented. The surfaces of the blade-coated layers have rough features of the order of several micrometers. Using 2 nm and 13 nm X-rays scattered at angular ranges of 5° ≤ θ ≤ 51° and 5° ≤ θ ≤ 45°, respectively, a combined range of scattering vector of 0.00842 Å(-1) ≤ Q ≤ 0.4883 Å(-1) was obtained. Comparison with previous transmission SAXS and USAXS studies of the same materials indicates that the new method does probe the surface topology rather than the internal microstructure.

The linewidth of a 14.7 nm wavelength Ni-like Pd soft x-ray laser was measured in a single shot using a soft x-ray diffraction grating interferometer. The instrument uses the time delay introduced by the gratings across the beam to measure the temporal coherence. The spectral linewidth of the 4d1S0-4p1P1 Ni-like Pd lasing line was measured to be Δλ/λ=3×10(-5) from the Fourier transform of the fringe visibility. This single shot linewidth measurement technique provides a rapid and accurate way to determine the temporal coherence of soft x-ray lasers that can contribute to the development of femtosecond plasma-based soft x-ray lasers.

Hohlraums are employed at the national ignition facility to convert laser energy into a thermal x-radiation drive, which implodes a fusion capsule, thus compressing the fuel. The x-radiation drive is measured with a low spectral resolution, time-resolved x-ray spectrometer, which views the region around the hohlraum's laser entrance hole. This measurement has no spatial resolution. To convert this to the drive inside the hohlraum, the size of the hohlraum's opening ("clear aperture") and fraction of the measured x-radiation, which comes from this opening, must be known. The size of the clear aperture is measured with the time integrated static x-ray imager (SXI). A soft x-ray imaging channel has been added to the SXI to measure the fraction of x-radiation emitted from inside the clear aperture. A multilayer mirror plus filter selects an x-ray band centered at 870 eV, near the peak of the x-ray spectrum of a 300 eV blackbody. Results from this channel and corrections to the x-radiation drive are discussed.

We extend coherent diffraction imaging (CDI) to a high numerical aperture reflection mode geometry for the first time. We derive a coordinate transform that allows us to rewrite the recorded far-field scatter pattern from a tilted object as a uniformly spaced Fourier transform. Using this approach, FFTs in standard iterative phase retrieval algorithms can be used to significantly speed up the image reconstruction times. Moreover, we avoid the isolated sample requirement by imaging a pinhole onto the specimen, in a technique termed apertured illumination CDI. By combining the new coordinate transformation with apertured illumination CDI, we demonstrate rapid high numerical aperture imaging of samples illuminated by visible laser light. Finally, we demonstrate future promise for this technique by using high harmonic beams for high numerical aperture reflection mode imaging.

Diffraction efficiency of multilayer-coated blazed gratings (MBG) strongly depends on the perfection of the sawtooth-shaped layers in the overall composite structure. Growth of multilayers on sawtooth substrates should be carefully optimized to reduce groove profile distortion and, at the same time, to avoid significant roughening of multilayer interfaces. In this work, we report on a way to optimize growth of sputter-deposited Mo/Si multilayers on sawtooth substrates through variation of the sputtering gas pressure. We believe a new record for diffraction efficiency of 44% was achieved for an optimized MBG with groove density of 5250 lines/mm at the wavelength of 13.1 nm.

We present the fabrication and analysis of efficient and highly dispersive gratings for the x-ray and extreme ultraviolet (EUV) regime. We show that an asymmetric-cut multilayer structure can act as a near-perfect blazed grating. The precision and high line density are achieved by layer deposition of materials, which can be controlled to the angstrom level. We demonstrate this in the EUV regime with two structures made by cutting and polishing magnetron-sputtered multilayer mirrors of over 2000 bilayers thick, each with a period of 6.88 nm. These were cut at angles of 2.9° and 7.8° to the surface. Within the 3% bandwidth rocking curve of the multilayer, the angular dispersion of the diffracted wave was in agreement with the grating equation for elements with 7250 and 19,700 line pairs/mm, respectively. The dependence of the measured efficiency was in excellent agreement with a formulation of dynamical diffraction theory for multilayered structures. At a wavelength of 13.2 nm, the efficiency of the first-order diffraction was over 95% of the reflectivity of the uncut multilayer. We predict that such structures should also be effective at shorter x-ray wavelengths. Both the Laue (transmitting) and Bragg (reflecting) geometries are incorporated in our formalism, which is applied to the analysis of multilayer Laue lenses and focusing and dispersing Bragg optics.

Standing-wave-excited photoemission is used to study a SrTiO3/LaNiO3 superlattice. Rocking curves of core-level and valence band spectra are used to derive layer-resolved spectral functions, revealing a suppression of electronic states near the Fermi level in the multilayer as compared to bulk LaNiO3. Further analysis shows that the suppression of these states is not homogeneously distributed over the LaNiO3 layers but is more pronounced near the interfaces. Possible origins of this effect and its relationship to a previously observed metal-insulator-transition in ultrathin LaNiO3 films are discussed.

We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (±40 as) over the main reflectivity peak of the mirror.

Novel capping layer structures have been deposited on periodic Mo/Si multilayers to optimize reflectance at 30.4 nm. Design, deposition and characterization of such coatings are presented. Most of the structures proposed show improved performance with respect to standard Mo/Si multilayers and are stable over time. Reflectance at 121.6 nm and in the visible spectral range have been also tested to explore the applicability of such coatings to the Multi Element Telescope for Imaging and Spectroscopy (METIS) instrument, a coronagraph being developed for the ESA Solar Orbiter platform.

Ultra-high spectral resolution in the EUV and soft x-ray energy ranges requires the use of very high line density gratings with optimal design resulting in use of a Blazed Multilayer Grating (BMG) structure. Here we demonstrate the production of near-atomically perfect Si blazed substrates with an ultra-high groove density (10,000 l/mm) together with the measured and theoretical performance of an Al/Zr multilayer coating on the grating. A 1st order absolute efficiency of 13% and 24.6% was achieved at incidence angles of 11° and 36° respectively. Cross-sectional TEM shows the effect of smoothing caused by the surface mobility of deposited atoms and we correlate this effect with a reduction in peak diffraction efficiency. This work shows the high performance that can be achieved with BMGs based on small-period anisotropic etched Si substrates, but also the constraints imposed by the surface mobility of deposited species.

We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied "post-mortem" by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N2, leading to bubbles inside the multilayer structure.

We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources.

Magnesium/silicon carbide (Mg/SiC) multilayers have been fabricated with normal incidence reflectivity in the vicinity of 40% to 50% for wavelengths in the 25 to 50 nm wavelength range. However many applications, for example solar telescopes and ultrafast studies using high harmonic generation sources, desire larger bandwidths than provided by high reflectivity Mg/SiC multilayers. We investigate introducing a third material, Scandium, to create a tri-material Mg/Sc/SiC multilayer allowing an increase the bandwidth while maintaining high reflectivity.

We deal with the recent progress in the fabrication of the graded Co/C multilayer mirrors to be used in a 21x Schwarzschild objective (SO) operating at the wavelengths near 4.5 nm ("carbon window" region). The peak reflectivity of flat Co/C mirrors was measured to be 14.8% (wavelength of 4.48 nm, incidence angle of 5 degrees). The reflectivity curves of the spherical mirrors achieved 3%-6%, with the spectral matching accuracy being Deltad approximately 0.008 nm (Deltad/d approximately 0.3%). As a result the SO demonstrates a full working aperture (N(A) approximately 0.2) operation with the total throughput of 0.25%.

We present a variable line-space grating spectrometer for soft x-rays that covers the photon energy range between 130 and 650 eV. The optical design is based on the Hettrick-Underwood principle and tailored to synchrotron-based studies of radiation-sensitive biological samples. The spectrometer is able to record the entire spectral range in one shot, i.e., without any mechanical motion, at a resolving power of 1200 or better. Despite its slitless design, such a resolving power can be achieved for a source spot as large as (30 x 3000) microm2, which is important for keeping beam damage effects in radiation-sensitive samples low. The high spectrometer efficiency allows recording of comprehensive two-dimensional resonant inelastic soft x-ray scattering (RIXS) maps with good statistics within several minutes. This is exemplarily demonstrated for a RIXS map of highly oriented pyrolytic graphite, which was taken within 10 min.

Nonlinear optics plays a central role in the advancement of optical science and laser-based technologies. We report on the confinement of the nonlinear interaction of light with matter to a single wave cycle and demonstrate its utility for time-resolved and strong-field science. The electric field of 3.3-femtosecond, 0.72-micron laser pulses with a controlled and measured waveform ionizes atoms near the crests of the central wave cycle, with ionization being virtually switched off outside this interval. Isolated sub-100-attosecond pulses of extreme ultraviolet light (photon energy approximately 80 electron volts), containing approximately 0.5 nanojoule of energy, emerge from the interaction with a conversion efficiency of approximately 10(-6). These tools enable the study of the precision control of electron motion with light fields and electron-electron interactions with a resolution approaching the atomic unit of time ( approximately 24 attoseconds).

Extreme ultraviolet (EUV) optics play a key role in attosecond science since only with higher photon energies is it possible to achieve the wide spectral bandwidth required for ultrashort pulses. Multilayer EUV mirrors have been proposed and are being developed to temporally shape (compress) attosecond pulses. To fully characterize a multilayer optic for pulse applications requires not only knowledge of the reflectivity, as a function of photon energy, but also the reflected phase of the mirror. We develop the metrologies to determine the reflected phase of an EUV multilayer mirror using the photoelectric effect. The proposed method allows one to determine the optic's impulse response and hence its pulse characteristics.

The optical constants of electron-beam evaporated boron from 6.8 to 900 eV were calculated through transmittance measurements of boron thin films deposited onto carbon-coated microgrids or LiF substrates in ultrahigh-vacuum conditions. In the low-energy part of the spectrum the measurements were performed in situ on freshly deposited samples, whereas in the high-energy range the samples were exposed to the atmosphere before the measurements. The extinction coefficient was calculated directly from the transmittance data, and a Kramers-Kronig analysis that combined the current data with data from the literature was performed to determine the dispersive part of the index of refraction. Finally, two different sum-rule tests were performed that indicated the good consistency of the data.

At the recently built FLASH x-ray free-electron laser, we studied the reflectivity of Si/C multilayers with fluxes up to 3 x 10(14) W/cm2. Even though the nanostructures were ultimately completely destroyed, we found that they maintained their integrity and reflectance characteristics during the 25-fs-long pulse, with no evidence for any structural changes over lengths greater than 3 A. This experiment demonstrates that with intense ultrafast pulses, structural damage does not occur during the pulse, giving credence to the concept of diffraction imaging of single macromolecules.

Aperiodic multilayers have been designed for various applications, using numeric algorithms and analytical solutions, for many years with varying levels of success. This work developed a more realistic model for simulating aperiodic Mo/Si multilayers to be used in these algorithms by including the formation of MoSi(2). Using a genetic computer code we were able to optimize a 45 masculine multilayer for a large bandpass reflection multilayer that gave good agreement with the model.

We present a method for repairing defects near the top surfaces of multilayer coatings in general and specifically on extreme-ultraviolet lithography mask blanks. Milling away the defect and a surrounding region of the multilayer by use of a focused ion beam can repair both the reflectivity and the phase of the reflected light in the vicinity of such a defect. We describe the conditions under which the repaired region will not itself be a defect and experimentally demonstrate the feasibility of this multilayer repair technique. The results described are also applicable to understanding and controlling the optical effects of ion-induced multilayer erosion.

Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (EUV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have approximately 40x longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose.

To the best of our knowledge, the first direct measurement of the dispersive part of the refractive index is performed at extreme-ultraviolet (EUV) wavelengths, where absorption is higher as compared with hard-x-ray and visible wavelengths. A novel diffractive optical element that combines the functions of a grating and a zone plate is fabricated with Fourier optical techniques and employed here for the first time at EUV/soft-x-ray wavelengths. Both the real and the imaginary parts of the complex refractive indices are measured directly by this technique without recourse to Kramers-Kronig transformations. Data for Al and Ni in the vicinity of their L and M edges, respectively, are presented as first examples of this technique.

We report what is believed to be the first demonstration that volume gratings diffract extreme-ultraviolet light (EUV) or soft x-rays into high orders approximately an order of magnitude more efficiently than predicted by classical thin-grating theory. At the 13-nm wavelength, copolymer grating structures with 200-nm period and aspect ratios of ~10:1 achieved diffraction efficiencies of 11.2%, 15.3%, 11.5%, and 9.1% in the orders m of 2, 3, 4, and 5, respectively. In addition, the measured transmission spectra are consistent with electrodynamic calculations by coupled-wave theory. High-order diffraction can now be employed for substantially improved diffractive EUV and x-ray optics, e.g., highly resolving diffractive lenses and large-aperture condensers.

Partial-fluorescence-yield (PFY) x-ray absorption measurements, rising the optimized window widths of position sensitive detectors in wave-length dispersive x-ray spectrometers, have been applied for radiative process-resolved (RPR) x-ray absorption spectroscopy. We have measured PFY-absorption spectra of graphite and diamond at the C K threshold and of h-BN and c-BN at the B K threshold. Resonant elastic x-ray scattering was observed in graphite and h-BN on their PFY-absorption spectra, and excitonic x-ray scattering was observed in diamond and c-BN. These results show that PFY-absorption measurements for RPR x-ray absorption spectroscopy can provide the information about the electronic structures and the radiative-decay process in inner-shell excitation.

The performance of the recently developed EUV phase-shifting point diffraction interferometer (PS/PDI) depends heavily on the characteristics of the grating beamsplitter used in the implementation. Ideally, such a grating should provide throughput of better than 25% and diffraction efficiency, defined as the ratio of the first-diffracted-order power to the zero-order power, variable in the range from approximately 10 to 500. The optimal method for achieving these goals is by way of a phase grating. Also, PS/PDI system implementation issues favor the use of transmission gratings over reflection gratings. Here, the design, fabrication, and characterization of a recently developed transmission phase grating developed for use in EUV interferometry is described.

The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.

Recent progress in the design of aspheric wave-front recording systems has permitted the manufacture of holographic gratings with highly variable groove densities that are suitable for flat-field spectrographs. A holographic grating thus recorded was processed to produce a laminar profile by use of reactive-ion etching. Measurements are reported of the absolute diffraction efficiency of this grating and of a comparable mechanically ruled grating. It is found that the holographic grating is much more effective in suppressing the higher orders. The spectral resolution was determined by use of a carbon Kalpha x-ray generator and a spectrograph with an imaging detector. The spectral resolution of the holographic grating was approximately 3 times worse than that of the ruled grating.

Transmission measurements for the optical constants delta, beta of thecomplex refractive index n = 1 - delta + ibeta of molybdenum are performed in the energy range 60-930eV. Free-standing C/Mo/C foils of five different thicknesses are used, and the results are normalized for the presence of the carbon layers in the samples. These absorption results are combined with previous experimental data in the lower energy range and values fromthe atomic tables to obtain the imaginary (absorptive) part of the refractive index for molybdenum in the range 1-30,000 eV. The real(dispersive) part of n was calculated from Kramers-Kronig analysis with the above absorption data. An evaluation with the partial sum rules demonstrates that this new compilation provides an improved set of values for n covering a wider energy range compared with the current tabulated values. The new results are applied so as to calculate thenormal-incidence reflectivities of Mo/Si and Mo/Be multilayer mirrors.

The refractive index n = 1 - delta + ibeta of Si in the energy range 50-180 eV is investigated with angle-dependent reflectance measurements. The optical constants delta and beta are both determined by fitting to the Fresnel equations. The results of this method are compared with the values in the atomic tables derived from experimental data for beta and implementation of the Kramers-Kronig relations for delta. The samples were prepared by UV irradiation and HF:ethanol dipping to H passivate the surface. It is found that the values of delta in the atomic tables are 8-15% too high in the region 50-90 eV. This is attributed to missing oscillator strength in the tabulated absorption coefficient for Si. The measured values of beta for crystalline Si exhibit structure below the L (2,3) edge (99.8 eV), as was previously observed in transmission measurements of Si(111). It is also found that the method of least-squares fitting reflectance data to obtain optical constants is most effective for energies well below the edge, where delta > beta, while for a range of energies around and above the edge, where delta < beta, the optical constants are determined with large uncertainties. This behavior is not unique to the Si L(2,3) edge.

The effect of layer thickness disorder in periodic multilayers on x-ray reflectivity is investigated numerically and experimentally. We present ensemble calculations, taking into account absorption and interfacial roughness. It is demonstrated that layer thickness disorder yields band broadening and increased integrated reflectivity For applications we concentrate on extrema of the ensembles, giving the highest integrated reflectivity We develop global optimization methods that can also be used to generate specified reflection band structures. In a few examples, applications of the optimization methods are discussed. To illustrate the practical applicability of the methods, we compare experimental realizations to the calculation. In one case we achieve a 42% increase in integrated reflectivity in the 130 Å < λ < 190 Å spectral range with respect to a periodic multilayer with its first-order Bragg peak in the center of that range. Accurate control of layer thicknesses is our main experimental obstacle.