1. Direct Electrodeposition of Electrically Conducting Ni 3 (HITP) 2 MOF Nanostructures for Micro-Supercapacitor Integration.
- Author
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Behboudikhiavi S, Chanteux G, Babu B, Faniel S, Marlec F, Robert K, Magnin D, Lucaccioni F, Omale JO, Apostol P, Piraux L, Lethien C, and Vlad A
- Abstract
Micro-supercapacitors emerge as an important electrical energy storage technology expected to play a critical role in the large-scale deployment of autonomous microdevices for health, sensing, monitoring, and other IoT applications. Electrochemical double-layer capacitive storage requires a combination of high surface area and high electronic conductivity, with these being attained only in porous or nanostructured carbons, and recently found also in conducting metal-organic frameworks (MOFs). However, techniques for conformal deposition at micro- and nanoscale of these materials are complex, costly, and hard to upscale. Herein, the study reports direct, one step non-sacrificial anodic electrochemical deposition of Ni
3 (2,3,6,7,10,11-hexaiminotriphenylene)2 - Ni3 (HITP)2 , a porous and electrically conducting MOF. Employing this strategy enables the growth of Ni3 (HITP)2 films on a variety of 2D substrates as well as on 3D nanostructured substrates to form Ni3 (HITP)2 nanotubes and Pt@ Ni3 (HITP)2 core-shell nanowires. Based on the optimal electrodeposition protocols, Ni3 (HITP)2 films interdigitated micro-supercapacitors are fabricated and tested as a proof of concept., (© 2024 Wiley‐VCH GmbH.)- Published
- 2024
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