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1. Highly selective electroplated nickel mask for lithium niobate dry etching

Author

Benchabane, Sarah, Robert, Laurent, Rauch, Jean-Yves, Khelif, Abdelkrim, and Laude, Vincent

Subjects
Etching -- Usage, Holes (Electron deficiencies) -- Evaluation, Lithium niobate -- Electric properties, Nickel -- Electric properties, Physics
Abstract

A sulfur hexafluoride based reactive ion etching process is described that has allowed etching several micron deep holes with diameters of the order of a few microns in lithium niobate. The affect of process parameters such as applied radio frequency (rf) power or operating pressure on the sidewall slope angle of the etched patterns is examined.

Published
2009

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