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Radio frequency sputtering of a hot-pressed CaF2 target in pure argon plasma is used in the deposition of calcium fluoride thin films on different substrates. Low power of sputtering causes the formation of cracks and fractures in the target material. Maximum deposition of films is only 2.1 nanometers per minute. Depletion of the films' fluorine content is revealed by Rutherford backscattering spectroscopy. Oxygen content in the film is very low.

Copper nanoparticles (NPs) are prepared by inert-gas condensation of a sputtered metallic vapor by using a dedicated commercial reactor. The studies have highlighted the role of process parameters and the strong influence of the reactor temperature profile on the NP size distribution.