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4 results on '"Nakaoka K"'

1. Crystal growth of Ba concentration controlled YBCO films by TFA-MOD process

Author

Teranishi, R., Tada, K., Yoshida, J., Yamada, K., Mori, N., Mukaida, M., Nakaoka, K., Miura, M., Yoshizumi, M., Izumi, T., and Shiohara, Y.

Subjects
Barium compounds -- Electric properties, Barium compounds -- Magnetic properties, Coating processes -- Analysis, Copper oxide superconductors -- Electric properties, Copper oxide superconductors -- Magnetic properties, Electric currents -- Measurement, Yttrium -- Electric properties, Yttrium -- Magnetic properties, Business, Electronics, Electronics and electrical industries
Published
2009

2. Development of TFA-MOD process for coated conductors in Japan

Author

Izumi, T., Yoshizumi, M., Miura, M., Nakaoka, K., Sutoh, Y., Ichikawa, Y., Miyata, S., Ibi, A., Fukushima, H., Itoh, T., Takahashi, T., Aoki, Y., Koizumi, T., Kaneko, A., Hasegawa, T., Yamada, Y., and Shiohara, Y.

Subjects
Coating processes -- Analysis, Electric currents -- Measurement, Superconductivity -- Analysis, Business, Electronics, Electronics and electrical industries
Published
2009

3. Optimization of process parameters for calcination in TFA-MOD method

Author

Nakaoka, K., Matsuda, J., Yoshizumi, M., Goto, T., Yamada, Y., Izumi, T., and Shiohara, Y.

Subjects
Mathematical optimization -- Analysis, Microstructure -- Research, Dielectric films -- Magnetic properties, Thin films -- Magnetic properties, Business, Electronics, Electronics and electrical industries
Abstract

The analysis presents the optimization of various process parameters that are used for calcination in the TFA-MOD (metal-organic deposition using trifluoroacetates) method. The results show that it is very important to introduce water vapor at high temperatures in the calcination of YBCO films.

Published
2007

4. Recent progress on R&D of advanced TFA-MOD process for coated conductors

Author

Izumi, Teruo, Matuda, J. S., Nakaoka, K., Kitoh, Y., Sutoh, Y., Nalkanishi, T., Yoshizumi, M., Yamada, Y., and Shiohara, Y.

Subjects
Integrated circuit fabrication -- Analysis, Fluorine compounds -- Electric properties, Dielectric films -- Electric properties, Thin films -- Electric properties, Integrated circuit fabrication, Business, Electronics, Electronics and electrical industries
Abstract

The progress on the R&D of the advanced (TFA-MOD) (metal-organic deposition using trifluoroacetates) process for the fabrication of coated conductors in Japan is discussed. A new technique to avoid the crack formation in these films is presented.

Published
2007

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