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1. Effect of inductively coupled plasma oxidation on properties of magnetic tunnel junctions

Author

Ohsung Song, Y. M. Lee, C. S. Yoon, and C. K. Kim

Subjects
Plasma physics -- Research, Oxidation-reduction reaction -- Analysis, Physics
Abstract

The electrical and magnetic properties of the junctions whose tunnel barrier was produced using inductively coupled plasma (ICP) oxidation were investigated. Remote ICP oxidation unlike dc or rf plasma oxidation shows high tolerance against the prolonged oxidation period, thus substantially improving the reliability of the oxidation process.

Published
2003

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