1. INFLUENCE OF THE PVD PROCESS PARAMETERS ON ZNO: AL THIN FILMS
- Author
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Paulina Boryło, Krzysztof Matus, Krzysztof Lukaszkowicz, Marek Szindler, and Klaudiusz Gołombek
- Subjects
TCL ,MZO ,PVD ,ZnO:Al ,SEM ,AFM ,Engineering (General). Civil engineering (General) ,TA1-2040 - Abstract
In recent years a growing interest in searching new material for producing Transparent Conductive Layers (TLC) is observed. ZnO:Al thin films are this type material, interesting due to wide range of potential applications where it can be applied like: transparent electrodes, gas sensors, thin film transistors, sensor devices, electroluminescent diodes and others. The aim of this paper is to discuss influence of the ZnO:Al film deposition parameters of PVD magnetron sputtering method on TCL structure and its chemical composition. It contains description of the ZnO:Al PVD magnetron sputtering deposition method. It discusses results obtained from the analysis of the microstructure of ZnO:Al thin films using a high resolution scanning electron microscope, layers' surface topography determined with atomic force microscope and results of chemical composition analyses.
- Published
- 2017