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Rotatable magnetron sputtering is still a promising technique for scaling up of large area deposition of high temperature superconducting thin films. Furthermore, it represents a standard equipment for very large area web coating and glass coating in industrial environment. We have already demonstrated that with rotatable magnetron sputtering epitaxial c-axis oriented NdBa2Cu3O7-x (NBCO) thin films could be obtained on MgO and YSZ single crystals and buffered tapes. The superconducting properties, like Tc and Jc, of these films are still reduced due to low pressure sputtering. The c-axis lattice parameter is expanded or the sputtered NBCO thin film exists of 2 phases, one with the correct c-axis parameter and the other phase shows an elongated c-axis parameter, which influences the superconducting properties. In this work we will investigate the properties of thin films, sputtered with a nonstoichiometric target at low pressure (classical sputter regime). Especially, the influence of the oxygen partial pressure is very important and will be studied. [ABSTRACT FROM AUTHOR]

Studies the sputter deposition of YBa[sub 2]Cu[sub 3]O[sub 7-x] coated semiconductor films. Deposition speed as a function of sputter power; Ramping of the heater power; Optimized deposition conditions.

Examines the deposition of biaxially aligned yttria stabilized zirconia layers on metal semiconductor tape by modified magnetron sputtering. Static deposition; Continuous deposition without and with substrate cooling; Substrate temperature as a function of deposition time for a series of deposition conditions.