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Fluorination of single-wall carbon nanotubes (SWCNTs) was performed by using the CF4 radio-frequency plasma technique. The structural and bonding properties of the plasma-processed SWCNTs were investigated by transmission electron microscopy, x-ray photoelectron spectroscopy, and Raman spectroscopy. The plasma parameters, i.e., self-biased voltage, plasma ion density, and ion dose, substantially affected the structural and bonding properties of plasma-processed SWCNTs. We show that sidewall fluorination of SWCNTs occurs in CF4 plasma at low self-biased voltages. Plasma conditions for the sidewall fluorination of SWCNTs are discussed. [ABSTRACT FROM AUTHOR]