1. High-Quality Single Crystalline Sc 0.37 Al 0.63 N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy.
- Author
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Yin, Yuhao, Liu, Rong, Zhao, Haiyang, Fan, Shizhao, Zhang, Jianming, Li, Shun, Sun, Qian, and Yang, Hui
- Subjects
MOLECULAR beam epitaxy ,THIN films ,RADIOGRAPHIC films ,ACTIVE nitrogen ,PHASE separation - Abstract
We attained wurtzite Sc
x Al1−x N (0.16 ≤ x ≤ 0.37) thin films by varying the Sc and Al fluxes at a fixed active nitrogen flux during plasma-assisted molecular beam epitaxy. Atomic fluxes of Sc and Al sources via measured Sc percentage in as-grown Scx Al1−x N thin films were derived as the feedback for precise determination of the Scx Al1−x N growth diagram. We identified an optimal III/N atomic flux ratio of 0.78 for smooth Sc0.18 Al0.82 N thin films. Further increasing the III/N ratio led to phase separation under N-rich conditions, validated by the observation of high-Sc-content hillocks with energy-dispersive X-ray spectroscopy mapping. At the fixed III/N ratio of 0.78, we found that phase separation with high-Al-content hillocks occurs for x > 0.37, which is substantially lower than the thermodynamically dictated threshold Sc content of ~0.55 in wurtzite Scx Al1−x N. We postulate that these wurtzite-phase purity degradation scenarios are correlated with adatom diffusion and the competitive incorporation process of Sc and Al. Therefore, the Scx Al1−x N growth window is severely restricted by the adatom kinetics. We obtained single crystalline Sc0.37 Al0.63 N thin films with X-ray diffraction (002)/(102) ω rocking curve full-width at half-maximums of 2156 arcsec and 209 arcsec and surface roughness of 1.70 nm. Piezoelectric force microscopy probing of the Sc0.37 Al0.63 N epilayer validates unambiguous polarization flipping by 180°. [ABSTRACT FROM AUTHOR]- Published
- 2024
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