1. Characterization of fully silicided source/drain SOI UTBB nMOSFETs at cryogenic temperatures.
- Author
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Han, Yi, Xi, Fengben, Allibert, Frederic, Radu, Ionut, Prucnal, Slawomir, Bae, Jin-Hee, Hoffmann-Eifert, Susanne, Knoch, Joachim, Grützmacher, Detlev, and Zhao, Qing-Tai
- Subjects
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QUANTUM computing , *THRESHOLD voltage , *TEMPERATURE , *CRYOELECTRONICS , *METAL oxide semiconductor field-effect transistors - Abstract
• SOI UTBB nMOSFETs are operated at cryogenic temperature with different gate lengths. • The impact of the back-gate on the device performance is systematically studied. • A good performance of devices is obtained at cryogenic temperature by back-gate. • Short channel effects are investigated at cryogenic temperature. In this paper we present an experimental study of SOI UTBB n-MOSFETs at cryogenic temperatures. The device employs fully silicided source/drain with dopant segregation formed by "Implantation Into Silicide" (IIS) process. The impact of the back-gate (V back) on the device performance is systematically investigated. The results demonstrate that V back is essential to tune the threshold voltage V th. And optimization of V back values can improve the subthreshold swing (SS), Drain-Induced Barrier Lowering (DIBL), transconductance G m and mobility at cryogenic temperatures, providing a potential to fulfill the ultra-low power requirement for quantum computing application. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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