1. Fabrication of Semiconductor- and Polymer-Based Photonic Crystals Using Nanoimprint Lithography.
- Author
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Arakcheeva, E. M., Tanklevskaya, E. M., Nesterov, S. I., Maksimov, M. V., Gurevich, S. A., Seekamp, J., and Torres, C. M. Sotomayor
- Subjects
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SEMICONDUCTORS , *CRYSTALS , *LITHOGRAPHY , *POLYMERS , *POLYMETHYLMETHACRYLATE , *CRYSTAL etching , *PHYSICS - Abstract
The technology of fabricating photonic crystals with the use of nanoimprint lithography is described. One- and two-dimensional photonic crystals are produced by direct extrusion of polymethyl methacrylate by Si moulds obtained via interference lithography and reactive ion etching. The period of 2D photonic crystals, which present a square array of holes, ranges from 270 to 700 nm; the aperture diameter amounts to the half-period of the structure. The holes are round-shaped with even edges. One-dimensional GaAs-based photonic crystals are fabricated by reactive ion etching of GaAs to a depth of 1 μm through a mask formed using nanoimprint lithography. The resulting crystals have a period of 800 nm, a ridge width of 200 nm, and smooth nearly vertical side walls. © 2005 Pleiades Publishing, Inc. [ABSTRACT FROM AUTHOR]
- Published
- 2005
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