1. Technological development of high-k dielectric FinFETs for liquid environment.
- Author
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Rigante, S., Scarbolo, P., Bouvet, D., Wipf, M., Bedner, K., and Ionescu, A.M.
- Subjects
- *
DIELECTRICS , *FIELD-effect transistors , *FINITE element method , *ENERGY consumption , *PH effect , *HAFNIUM oxide - Abstract
Abstract: This work presents the technological development and characterization of n-channel fully depleted high-k dielectric FinFETs (Fin Field Effect Transistor) for applications in a liquid environment. Herein, we provide a systematic approach based on Finite Element Analysis for a high-control fabrication process of vertical Si-fins on bulk and we provide many useful fabrication expedients. Metal gate FinFETs have been successfully electrically characterized, showing excellent subthreshold slope SS=72mV/dec and high Ion /Ioff ≈106 ratio, with power consumption of the order of tens of nW. The FinFETs have also been proved to correctly behave in a liquid environment. We also present the HfO2 characterization towards full pH response sensing applications. [Copyright &y& Elsevier]
- Published
- 2014
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