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Amorphous W-S-C-N lubricating films were prepared by sputtering two WS 2 targets and an additional WC target in Ar&N 2 atmosphere. The W-S-C-N film demonstrated a notably stable low coefficient of friction (COF) of approximately 0.01, as well as a wear rate of 1.50 × 10-7 mm3/Nm over extended sliding cycles. These characteristics indicated superior tribological properties compared to the deposited WS 2 , W-S-C, and W-S-N films. The formation of the friction-induced well-crystallized WS 2 transfer film with its (002) basal plane parallel to the sliding surface of the counterpart ball contributed to the low friction of the W-S-C-N film. Furthermore, the embedded amorphous and nanocrystalline WC phase within the crystallized WS 2 -based transfer film further enhanced the stability and durability of the transfer film. [Display omitted] • Completely amorphous W-S-C-N were prepared by sputtering WS 2 and WC targets in Ar + N 2 atmosphere. • W-S-C-N film exhibited low and stable friction coefficient during long sliding cycles. • friction-induced well crystallized thick transfer film contributed to the superior tribological performance of the W-S-C-N film. [ABSTRACT FROM AUTHOR]

Due to their versatile and unique properties, tantalum-based thin films have been extensively studied. However, tantalum is susceptible to oxidation due to its higher chemical activity, which is crucial regardless of whether oxidations of Ta are beneficial or detrimental. Therefore, the oxidation of Ta during material processing, especially without conscious means, should be taken seriously. In this study, pure Ta films were fabricated by magnetron sputtering under set procedure parameters. The effects of base pressure and substrate temperature on the degree of oxidation of Ta films were investigated. The results revealed that the magnitude of the base pressure directly affects the oxidation state of the as-deposited Ta films. When preferably avoiding the oxidation of sputtered Ta films, the base pressure should be controlled below 4.4 × 10−4 Pa. The substrate temperature has little effect on the oxidation state of the as-deposited Ta films under a base pressure ranging from about 10−2 Pa to 10−4. We hope that this study can provide some references for controlling the oxidation states of Ta involved in relevant film preparation. [ABSTRACT FROM AUTHOR]

The work reports on the morphologies and the tribological properties of MoS 2 films deposited onto the as-deposited or textured TiN and WC interlayers. The closed-field unbalanced magnetron sputtered MoS 2 film exhibited dense structure without obvious voids or columnar morphology. Meanwhile, plenty of MoS 2 nanowires or nanorods were grown on the film surface. With the laser-textured TiN or WC interlayer introduced, both the textured TiN/MoS 2 film and WC/MoS 2 film exhibited a long lubricating life higher than 8.0 × 105 sliding cycles, much higher than that for the un-textured films or pure MoS 2 film. • MoS 2 films with textured TiN, WC interlayer were deposited by a closed-field unbalanced-magnetron sputtering system. • The deposited MoS 2 film exhibited a dense structure with plenty of nanowires or nanorods grown between the MoS 2 columnar. • The textured TiN/MoS 2 film and WC/MoS 2 film exhibited a long lubricating life higher than 8.0 × 105 sliding cycles. [ABSTRACT FROM AUTHOR]