1. H–Si doping profile in GaAs by scanning tunneling microscopy.
- Author
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Grandidier, B., Silvestre, S., Nys, J. P., Me´lin, T., Bernard, D., Stie´venard, D., Constant, E., and Chevallier, J.
- Subjects
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HYDROGENATION , *SCANNING tunneling microscopy - Abstract
Hydrogen incorporation in n-type Si-doped GaAs layers results in the neutralization of the active dopants and a change of the conductivity along the growth direction. To characterize the active dopant concentration of doped GaAs layers containing hydrogen, we have used secondary ion mass spectroscopy and cross-sectional scanning tunneling microscopy. Spectroscopic measurements are performed as well as conductance images to visualize the variation of the conduction band-edge position. Such a variation, which is related to the concentration of Si–H complexes, allows the determination of the doping profile. © 2001 American Institute of Physics. [ABSTRACT FROM AUTHOR]
- Published
- 2001
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